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首页> 外文期刊>Surface Science Reports >The study of the local atomic structure by means of X-ray photoelectron diffraction
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The study of the local atomic structure by means of X-ray photoelectron diffraction

机译：X射线光电子衍射研究局部原子结构

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Photoelectron diffraction is under rapid development to a powerful method for the investigation of structures at surfaces. Within the escape length of photoelectrons an element-specific signal can be chosen from the photoelectron spectrum in order to separately investigate the local structure around a certain element, or in highresolution mode, the local structure around a specific chemical state. A brief overview of the theoretical and numerical aspects on calculating X-ray photoelectron diffraction intensities is given. The experimental two branches of recording photoelectron diffraction patterns as a function of angle or energy are discussed. Presently these branches merge due to the availability of tunable high-flux X-ray radiation from third generation synchrotron sources. Examples for structures at surfaces and buried interfaces are discussed. Spin-dependent scattering and diffraction processes within the surface layer may lead to spin-depending intensities observed at the detector. This opens a possible way to investigate magnetic buried structures.
机译：光电子衍射正迅速发展成为一种研究表面结构的有力方法。在光电子的逸出长度内，可以从光电子谱中选择特定于元素的信号，以便分别研究某个元素周围的局部结构，或者以高分辨率模式研究特定化学状态周围的局部结构。简要概述了计算X射线光电子衍射强度的理论和数值方面。讨论了作为角度或能量的函数的记录光电子衍射图的实验性两个分支。当前，由于来自第三代同步加速器源的可调高通量X射线辐射的可用性，这些分支合并了。讨论了表面和掩埋界面结构的示例。表面层内自旋相关的散射和衍射过程可能导致在检测器处观察到自旋相关的强度。这为研究磁性埋藏结构开辟了一种可能的方式。

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