• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Thin Solid Films >Effect of substrate temperature and annealing on structure, stress and properties of reactively co-sputtered Ni-TiN nanocomposite thin films
【24h】

Effect of substrate temperature and annealing on structure, stress and properties of reactively co-sputtered Ni-TiN nanocomposite thin films

机译：衬底温度和退火对共溅射Ni-TiN纳米复合薄膜结构，应力和性能的影响

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Nanocomposite thin films with TiN dispersed in Ni matrix were deposited in an environment having Ar:N-2 = 1:2 on silicon (100) substrate with bias of -60 V at 300 degrees C, 500 degrees C or 700 degrees C by co-sputtering of Ti and Ni targets used as RF and DC sources, respectively. The structure and properties of these films were compared with those deposited at ambient temperature and then annealed for 1 h in vacuum at above-mentioned temperatures. Whereas <111> is the preferred orientation of Ni, transition from <100> to <111> is observed for TiN at temperatures >= 500 degrees C, as confirmed by XRD analyses. The average grain sizes of Ni and TiN have been found to be in the ranges of 11-25 nm and 6-13 nm, respectively, using both XRD and TEM studies. Transition from compressive to tensile residual stress is observed with increase in substrate temperature for deposition or annealing. Hardness, elastic moduli and scratch-resistance of the films evaluated using a nanoindentor are found to possess the most optimum values on their growth at substrate temperature of 300 degrees C. (C) 2017 Elsevier B.V. All rights reserved.
机译：将TiN分散在Ni基体中的纳米复合薄膜在Ar：N-2 = 1：2的环境下以300 V，500°C或700°C的-60 V偏压在硅（100）基板上沉积溅射分别用作射频和直流源的Ti和Ni靶。将这些膜的结构和性质与在环境温度下沉积的膜的结构和性质进行比较，然后在上述温度下在真空中退火1小时。 XRD分析证实，<111>是Ni的优选取向，而TiN在> = 500摄氏度的温度下观察到从<100>到<111>的转变。使用XRD和TEM研究发现，Ni和TiN的平均晶粒尺寸分别在11-25 nm和6-13 nm范围内。随着用于沉积或退火的衬底温度的升高，观察到从压缩残余应力到拉伸残余应力的转变。发现使用纳米压痕仪评估的薄膜的硬度，弹性模量和耐刮擦性在基材温度为300摄氏度时具有最佳增长值。（C）2017 Elsevier B.V.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号