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首页> 外文期刊>Thin Solid Films >Deposition of hematite Fe_2O_3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system
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Deposition of hematite Fe_2O_3 thin film by DC pulsed magnetron and DC pulsed hollow cathode sputtering system

机译：直流脉冲磁控管和直流脉冲空心阴极溅射系统沉积赤铁矿Fe_2O_3薄膜

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摘要

Semiconducting hematite Fe_2O_3 thin films were fabricated by means of reactive sputtering in a high power DC pulsed magnetron (HIPIMS) and in a DC pulsed hollow cathode plasma jet sputtering system. Fused silica slides (quartz) were used as substrates. Both plasma processes were monitored with the help of a quartz crystal monitor (QCM) that was also fitted with magnetic field electron suppression filter and biased collecting electrode. This set up measured the deposition rate and the ratio of ionized to neutral fluxes of depositing particles on the substrate during the coating process. The deposition methods were compared in terms of the properties of produced films such as crystalline structure, optical absorption and surface topography. The as-deposited hematite Fe_2O_3 thin films (without annealing) and after their thermal treatment (with annealing) were examined.
机译：在高功率直流脉冲磁控管（HIPIMS）和直流脉冲空心阴极等离子体喷射溅射系统中，通过反应溅射制备了半导电的赤铁矿Fe_2O_3薄膜。熔融石英玻片（石英）用作基材。借助石英晶体监测器（QCM）对两个等离子体过程进行监测，该石英监测器还装有磁场电子抑制滤波器和偏置收集电极。该设置可测量沉积速率以及在涂覆过程中基材上沉积粒子的离子通量与中性通量之比。根据生产的膜的性质（例如晶体结构，光吸收和表面形貌）比较了沉积方法。研究了沉积的赤铁矿Fe_2O_3薄膜（无退火）和热处理后的薄膜（有退火）。

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  • 来源
    《Thin Solid Films》 |2013年第31期|184-191|共8页
  • 作者

    Z. Hubicka; S. Kment; J. Olejnicek; M. Cada; T. Kubart; M. Brunclikova; P. Ksirova; P.Adamek; Z.Remes;

  • 作者单位

    Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 18200 Prague, Czech Republic;

    Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 18200 Prague, Czech Republic;

    Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 18200 Prague, Czech Republic;

    Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 18200 Prague, Czech Republic;

    Solid State Electronics, The Angstroem laboratory, Uppsala university, Box 534, 75121 Uppsala, Sweden;

    Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 18200 Prague, Czech Republic;

    Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 18200 Prague, Czech Republic;

    Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 18200 Prague, Czech Republic;

    Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 18200 Prague, Czech Republic;

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  • 正文语种 eng
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  • 关键词

    Sputtering; Hollow cathode; Thin films; HIPIMS;

    机译：溅射;空心阴极薄膜;HIPIMS;

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