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Nanostructure transition in Cr-C-N coatings deposited by pulsed closed field unbalanced magnetron sputtering

机译：脉冲闭合场不平衡磁控溅射沉积Cr-C-N涂层的纳米结构转变

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摘要

Cr-C-N coatings with different compositions, i.e. (C + N)/Cr atomic ratios (x) of 0.81-2.77, were deposited using pulsed closed field unbalanced magnetron sputtering by varying the chromium and graphite target powers, the pulse configuration and the ratio of the nitrogen flow rate to the total gas flow rate. Three kinds of nanostructures were identified in the Cr-C-N coatings dependent on the x values: a nano-columnar structure of hexagonal closed-packed (hep) Cr2(C,N) and face-centered cubic (fee) Cr(C,N) at x = 0.81 and 1.03 respectively, a nanocomposite structure consisting of nanocrystalline Cr(C,N) embedded in an amorphous C(N) matrix at x = 1.26 and 1.78, and a Cr-containing amorphous C(N) structure at x = 2.77. A maximum hardness of 31.0 GPa and a high H/E ratio of 1.0 have been achieved in the nc-Cr(C, N)/a-C(N) nanocomposite structure at x= 1.26, whereas the coating with a Cr-containing amorphous C(N) structure had a minimum hardness of 10.9 GPa and a low H/E ratio of 0.08 at x = 2.77. The incorporation of carbon into the Cr-N coatings led to a phase transition from hcp-Cr2(C,N) to fcc-Cr(CN) by the dissolution into the nanocrystallites, and promoted the amorphization of Cr-C-N coatings with the precipitation of amorphous C(N). It was found that a high x value over 1.0 in the Cr-C-N coatings is the composition threshold to the nanostructure transition.
机译：通过改变铬和石墨的靶功率，脉冲构型和比率，使用脉冲闭场非平衡磁控溅射沉积具有不同组成的Cr-CN涂层，即（C + N）/ Cr原子比（x）为0.81-2.77。氮气流量与总气体流量之比。根据x值，在Cr-CN涂层中鉴定出三种纳米结构：六方密堆积（hep）Cr2（C，N）和面心立方（fee）Cr（C，N）的纳米柱状结构。 ）分别在x = 0.81和1.03处形成一种纳米复合结构，该结构由嵌入在x = 1.26和1.78处的非晶C（N）基质中的纳米晶体Cr（C，N）和在x处含铬的非晶C（N）结构= 2.77。在x = 1.26的nc-Cr（C，N）/ aC（N）纳米复合材料结构中，实现了31.0 GPa的最大硬度和1.0的高H / E比，而涂层中含Cr的无定形C （N）结构在x = 2.77时的最低硬度为10.9 GPa，H / E比低，为0.08。碳在Cr-N涂层中的掺入通过溶解到纳米微晶中导致从hcp-Cr2（C，N）到fcc-Cr（CN）的相变，并伴随沉淀促进Cr-CN涂层的非晶化无定形的C（N）。发现在Cr-C-N涂层中超过1.0的高x值是纳米结构转变的组成阈值。

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  • 来源
    《Thin Solid Films》 |2012年第13期|p.4264-4269|共6页
  • 作者

    Z.L. Wu; J. Lin; J.J.Moore; M.K. Lei;

  • 作者单位

    Surface Engineering Laboratory, School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China;

    Advanced Coatings and Surface Engineering Laboratory (ACSEL), Colorado School of Mines, Golden, Colorado 80401, USA;

    Advanced Coatings and Surface Engineering Laboratory (ACSEL), Colorado School of Mines, Golden, Colorado 80401, USA;

    Advanced Coatings and Surface Engineering Laboratory (ACSEL), Colorado School of Mines, Golden, Colorado 80401, USA;

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  • 正文语种 eng
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  • 关键词

    Cr-C-N coatings; nanostructure; pulsed closed field unbalanced magnetron; sputtering; nanocomposite; hardness;

    机译：Cr-C-N涂层;纳米结构脉冲闭合场不平衡磁控管;溅射纳米复合材料硬度;

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