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首页> 外文期刊>Thin Solid Films >Effect of deposition angle on the structure and properties of pulsed-DC magnetron sputtered TiAIN thin films
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Effect of deposition angle on the structure and properties of pulsed-DC magnetron sputtered TiAIN thin films

机译：沉积角对脉冲直流磁控溅射TiAIN薄膜结构和性能的影响

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This article reports the comparison of structure and properties of titanium aluminum nitride (TiAIN) films deposited onto Si(100) substrates under normal and oblique angle depositions using pulsed-DC magnetron sputtering. The substrate temperature was set at room temperature, 400 °C and 650 °C, and the bias was kept at 0, - 25, - 50, and - 80 V for both deposition angles. The surface and cross-section of the films were observed by scanning electron microscopy. It was found that as the deposition temperature increases, films deposited under normal incidence exhibit distinct faceted crystallites, whereas oblique angle deposited (OAD) films develop a kind of "tiles of a roof or "stepwise structure", with no facetted crystallites. The OAD films showed an inclined columnar structure, with columns tilting in the direction of the incident flux. As the substrate temperature was increased, the tilting of columns nearly approached the substrate normal. Both hardness and Young's modulus decreases when the flux angle was changed from a = 0° to 45° as measured by nanoindentation. This was attributed to the voids formed due to the shadowing effect. The crystallographic properties of these coatings were studied by 6-26 scan and pole figure X-ray diffraction. Films deposited at a = 0° showed a mixed (111) and (200) out-of-plane orientation with random in-plane alignment. On the other hand, films deposited at a = 45° revealed an inclined texture with (111) orientation moving towards the incident flux direction and the (200) orientation approaching the substrate normal, showing substantial in-plane alignment.
机译：本文报告了使用脉冲直流磁控溅射在法向角和倾斜角沉积下沉积在Si（100）衬底上的氮化铝钛（TiAIN）膜的结构和性能的比较。将衬底温度设定为室温，400℃和650℃，并且对于两个沉积角，将偏压保持在0，-25，-50和-80V。通过扫描电子显微镜观察膜的表面和横截面。已发现，随着沉积温度的升高，在垂直入射下沉积的薄膜会呈现出明显的多面微晶，而倾斜角沉积（OAD）的薄膜会形成一种“屋顶瓦片”或“阶梯状结构”，而没有多面微晶。薄膜呈倾斜的柱状结构，柱子沿入射通量方向倾斜；随着基板温度的升高，柱子的倾斜几乎接近基板法线；当通量角从a =改变时，硬度和杨氏模量均降低。通过纳米压痕法测得0°至45°，这归因于由于遮蔽效应而形成的空隙，通过6-26扫描和极谱X射线衍射研究了这些涂层的晶体学性质，在a = 0时沉积的膜°显示混合的（111）和（200）的面外取向以及随机的面内对齐；另一方面，以a = 45°沉积的膜显示出倾斜的织构，其中（111）o朝向入射通量方向移动的取向和接近衬底法线的（200）取向，显示出实质的平面内对齐。

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