MAGNETRON SPUTTERING GUN AND MAGNETRON SPUTTERING THIN FILM DEPOSITION APPARATUS

• 1. 靶头、磁控溅射靶枪及磁控溅射系统 [P] . 中国专利： CN113846304B . 2022.02.11
• 2. 靶头、磁控溅射靶枪及磁控溅射系统 [P] . 中国专利： CN113846304A . 2021-12-28
• 3. MAGNETRON SPUTTER FILM DEPOSITION APPARATUS, MAGNETRON SPUTTER FILM DEPOSITION METHOD, AND FILM MEMBER MANUFACTURED USING THE SAME [P] . 日本专利： JP2014070236A . 2014-04-21

  机译： 磁控溅射膜沉积装置，磁控溅射膜沉积方法以及使用该方法制造的膜成员

• 4. MAGNETRON SPUTTERING SYSTEM, AND METHOD OF THIN FILM DEPOSITION BY MAGNETRON SPUTTERING [P] . 日本专利： JP2002146529A . 2002-05-22

  机译： 磁控溅射系统及通过磁控溅射薄膜沉积的方法

• 5. PLANER MAGNETRON SPUTTERING APPARATUS AND PLANER MAGNETRON SPUTTERING FILM DEPOSITION METHOD [P] . 日本专利： JP2007031815A . 2007-02-08

  机译： 平面磁控溅射装置及平面磁控溅射膜沉积方法

• 1. Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering [J] . Steffen S?nderby, AsimAijaz, Ulf Helmersson, Surface & Coatings Technology . 2014,第Null期
• 2. Effect of the sputtering parameters on the physical properties and photocatalytic reactivity of TiO_2 thin films prepared by an RF magnetron sputtering deposition method [J] . Ebrahimi A., Kitano M., Iyatani K., Research on Chemical Intermediates . 2013,第4期
• 3. Experimental development and deposition of nanocomposite films by a hybrid dc magnetron sputtering and cluster gun technique [J] . Mohan DB, Cavaleiro A Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2009,第10期
• 4. A Two Magnetron Sputter Deposition Chamber Equipped with an Additional Ion Gun for in situ Observation of Thin Film Growth and Surface Modification by Synchrotron Radiation Scattering [C] . Norbert Schellx, Johannes von Borany, Jens Hauser International Conference on Synchrotron Radiation Instrumentation . 2007
• 5. Preparation, characterization and post-deposition modification of pulsed-dc magnetron sputtered Vanadium Oxide thin films for microbolometer applications [D] . Venkatasubramanian, Chandrasekaran 2010
• 6. Oblique angle deposition of nickel thin films by high-power impulse magnetron sputtering [O] . Hamidreza Hajihoseini, Movaffaq Kateb, Snorri Þorgeir Ingvarsson, 2019
• 7. Deposition of yttria-stabilized zirconia thin films by high power impulse magnetron sputtering and pulsed magnetron sputtering [O] . Sønderby, Steffen, Aijaz, Asim, Helmersson, Ulf, 2014

• 1. Apatite Deposition on ZrOsub2/subThin Films by DC Unbalanced Magnetron Sputtering [J] . Arisara Thaveedeetrakul ,Virote Boonamnuayvitaya ,Nirun Witit-anun . 材料物理与化学进展（英文） . 2012,第4期
• 2. Reactive DC Magnetron Sputtering Deposition of Copper Nitride Thin Film [J] . Xing＇ao LI ,Zuli LIU ,Kailun YAO . 材料科学技术：英文版 . 2007,第4期
• 3. CARBON FILMS PREPARED BY S-GUN MAGNETRON SPUTTERING USING GRAPHITE TARGET [J] . A.P.Clarke ,P.J.Clarke . 真空科学与技术学报 . 1992,第Z1期
• 4. Investigation of ITO Thin Film Deposited on Organic Films by RF Magnetron Sputter [J] . Sun Shuo Zhang Guiling Zhang Fujia . 兰州交通大学学报 . 2007,第6期
• 5. Enhanced deposition of ZnO films by Li doping using radio frequency reactive magnetron sputtering [J] . Liang-xian Chen ,Sheng Liu ,Cheng-ming Li . 矿物冶金与材料学报 . 2015,第010期
• 6. 工艺参数对磁控溅射纯Cr薄膜沉积过程的影响 [C] . 李洪涛 ,蒋百灵 ,杨波 . 第八届中国纳米科技西安研讨会 . 2009
• 7. 孪生Al靶反应高功率脉冲磁控溅射放电特性及Al2O3薄膜沉积工艺研究 [A] . 周广学 . 2020