TEM characterization of ALD layers in deep trenches using a dedicated FIB lamellae preparation method

著录项

• 来源
  《Thin Solid Films》 |2010年第16期|P.4553-4555|共3页
• 作者

  J. Gluch; rnT. Roessler; rnD. Schmidt; rnS.B. Menzel; rnM. Albert; rnJ. Eckert;

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• 作者单位

  IFW Dresden, P.O. Box 270116, D-01171 Dresden, Germany;

  rnTechnische Universitaet Dresden, Department of Electrical Engineering and Information Technology, D-01069 Dresden, Germany;

  rnTechnische Universitaet Dresden, Department of Electrical Engineering and Information Technology, D-01069 Dresden, Germany;

  rnIFW Dresden, P.O. Box 270116, D-01171 Dresden, Germany;

  rnTechnische Universitaet Dresden, Department of Electrical Engineering and Information Technology, D-01069 Dresden, Germany;

  rnIFW Dresden, P.O. Box 270116, D-01171 Dresden, Germany;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  ALD; FIB; TEM; high-k insulator; electrode material; deep trench;

  机译：ALD;FIB;TEM;高k绝缘子电极材料深沟;