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首页> 外文期刊>Thin Solid Films >Ce_(1-x)Nd_xO_(2-δ)/Si thin films obtained by pulsed laser deposition: Microstructure and conduction properties
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Ce_(1-x)Nd_xO_(2-δ)/Si thin films obtained by pulsed laser deposition: Microstructure and conduction properties

机译：通过脉冲激光沉积获得的Ce_（1-x）Nd_xO_（2-δ）/ Si薄膜：微观结构和导电性能

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摘要

Substituted Ce_(1-x)Nd_xO__(2-δ) cerium dioxide thin films are obtained by pulsed laser deposition technique. The films are deposited for various deposition times and at.% Nd, on [100] Si substrates, covered by a thin native SiO_2 layer. The evolution of the cell parameters with Nd content shows that a solid solution is formed, up to x=0.27. The thin films are homogenous in composition at a nanometer scale. The morphology of the grains does not change significantly with Nd content. The microstructure is columnar, with a preferential [100] growth direction. The width of the grains varies from 20 to 30 nm. The conductivities of the thin films are determined from impedance spectroscopy analyses, in the temperature range 200 ℃ to 600 ℃. The experimental data are explained in the frame of the space charge layer model.
机译：通过脉冲激光沉积技术获得了Ce_（1-x）Nd_xO __（2-δ）二氧化铈薄膜。薄膜以各种沉积时间和Nd％的浓度沉积在[100] Si衬底上，并被薄的天然SiO_2层覆盖。具有Nd含量的晶胞参数的演变表明形成了固溶体，直至x = 0.27。薄膜在纳米尺度上组成均匀。 Nd含量不会使晶粒的形态发生明显变化。微观结构是柱状的，具有优先的[100]生长方向。晶粒的宽度在20至30 nm之间变化。薄膜的电导率通​​过阻抗谱分析确定，温度范围为200℃至600℃。在空间电荷层模型的框架中解释了实验数据。

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  • 来源
    《Thin Solid Films》 |2008年第12期|3747-3754|共8页
  • 作者

    M. Chmielowska; S. Villain; A. Kopia; J.P. Dallas; J. Kusinski; J.R. Gavarri; Ch. Leroux;

  • 作者单位

    Universite du Sud Toulon-Var, L2MP (UMR CNRS 6137), Bat. R, BP20132, 83 957 La Garde, France University of Science and Technology AGH, al. Mickiewicza 30, 30-059 Cracow, Poland;

    Universite du Sud Toulon-Var, L2MP (UMR CNRS 6137), Bat. R, BP20132, 83 957 La Garde, France;

    University of Science and Technology AGH, al. Mickiewicza 30, 30-059 Cracow, Poland;

    University of Science and Technology AGH, al. Mickiewicza 30, 30-059 Cracow, Poland;

    University of Science and Technology AGH, al. Mickiewicza 30, 30-059 Cracow, Poland;

    Universite du Sud Toulon-Var, L2MP (UMR CNRS 6137), Bat. R, BP20132, 83 957 La Garde, France;

    Universite du Sud Toulon-Var, L2MP (UMR CNRS 6137), Bat. R, BP20132, 83 957 La Garde, France;

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  • 正文语种 eng
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  • 关键词

    pulsed laser deposition; impedance spectroscopy; electron microscopy; cerium dioxide thin films; solid solutions; space charge model;

    机译：脉冲激光沉积阻抗谱;电子显微镜;二氧化铈薄膜;固溶体;空间电荷模型;

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