...
首页> 外文期刊>Thin Solid Films >Polarity conversion of hydride vapor phase epitaxy growing GaN via growth interruption modulation
【24h】

Polarity conversion of hydride vapor phase epitaxy growing GaN via growth interruption modulation

机译:通过生长中断调制对氢化物气相外延生长GaN进行极性转换

获取原文
获取原文并翻译 | 示例
           

摘要

GaN films were deposited by hydride vapor phase epitaxy with and without adopting growth interruption modulation (GIM). The surface morphologies of these samples were observed by atomic force microscopy. After chemical etching, the surface morphology of GaN film grown directly on sapphire changed greatly and turned out to be N-polarity, which could be changed into Ga-polarity when growing via interruption modulation. Photoluminescence spectra showed that optical property of Ga-polar film was better than that of N-polar film. High resolution X-ray diffraction revealed the high crystalline quality GaN film grown by using the GIM method. The polarity conversion was the result of surface reconstruction when adopting GIM method.
机译:通过氢化物气相外延在有和没有采用生长中断调制(GIM)的情况下沉积GaN膜。通过原子力显微镜观察这些样品的表面形态。经过化学刻蚀后,直接在蓝宝石上生长的GaN膜的表面形貌发生了很大变化,变成N极性,通过中断调制生长时可以变成Ga极性。光致发光光谱表明,Ga-极性薄膜的光学性能优于N-极性薄膜。高分辨率X射线衍射揭示了使用GIM方法生长的高结晶质量GaN膜。极性转换是采用GIM方法进行表面重建的结果。

著录项

  • 来源
    《Thin Solid Films》 |2008年第12期|3772-3775|共4页
  • 作者单位

    State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning road, Shanghai 200050, People's Republic of China Graduate School of the Chinese Academy of Sciences, Peking 100039, People's Republic of China;

    State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning road, Shanghai 200050, People's Republic of China;

    State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning road, Shanghai 200050, People's Republic of China;

    State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning road, Shanghai 200050, People's Republic of China;

    State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning road, Shanghai 200050, People's Republic of China Graduate School of the Chinese Academy of Sciences, Peking 100039, People's Republic of China;

    State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning road, Shanghai 200050, People's Republic of China Graduate School of the Chinese Academy of Sciences, Peking 100039, People's Republic of China;

    State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning road, Shanghai 200050, People's Republic of China;

    State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning road, Shanghai 200050, People's Republic of China;

    Laboratoire Structures des Interfaces et Fonctionnalite des Couches Minces, UMR CNRS 6176, ENSICAEN,6 Boulevard du Marechal Juin, 14050 Caen Cedex, France;

    Laboratoire Structures des Interfaces et Fonctionnalite des Couches Minces, UMR CNRS 6176, ENSICAEN,6 Boulevard du Marechal Juin, 14050 Caen Cedex, France;

    Laboratoire de Recherche sur les Proprietes des Materiaux Nouveaux, IUT d'Alencon, 61250 Damigny, France;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    GaN; polarity; HVPE; AFM; PL; XRD;

    机译:癌症;肥胖;HV pe;A FM;PL;XRD;

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号