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Preparation and characterization of atomically flat and ordered silica films on a Pd(100) surface

机译：Pd（100）表面上原子平坦且有序的二氧化硅膜的制备和表征

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摘要

Ultrathin silica films with different thicknesses have been grown on a Pd(lOO) surface by depositing silicon in the presence of O_2. The film composition and electronic properties were characterized by X-ray photoelectron spectroscopy (XPS), ultraviolet photoelectron spectroscopy (UPS), and high-resolution electron energy loss spectroscopy (HREELS). Scanning tunneling microscopy was applied to investigate the film morphology and lattice structure. The results show that the obtained films are atomically flat and highly ordered in a long range. UPS and HREELS measurements indicate that the silica film has the same electronic and vibrational properties as bulk silica. A 2.8 nm thick film exhibits low defects in the film and high thermal stability up to 800 K, as evidenced by ion scattering spectroscopy and XPS.
机译：通过在O_2存在下沉积硅，可以在Pd（100）表面上生长具有不同厚度的超薄二氧化硅薄膜。通过X射线光电子能谱（XPS），紫外光电子能谱（UPS）和高分辨率电子能量损失能谱（HREELS）来表征膜的组成和电子性质。扫描隧道显微镜用于研究膜的形态和晶格结构。结果表明，所获得的膜在原子上是平坦的并且在长距离内高度有序。 UPS和HREELS测量表明，二氧化硅薄膜具有与块状二氧化硅相同的电子和振动特性。 2.8 nm厚的薄膜在薄膜中表现出低缺陷，并且在高达800 K的温度下具有很高的热稳定性，这通过离子散射光谱法和XPS证明。

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  • 来源
    《Thin Solid Films》 |2008年第12期|3741-3746|共6页
  • 作者

    Zhen Zhang; Zhiquan Jiang; Yunxi Yao; Dali Tan; Qiang Fu; Xinhe Bao;

  • 作者单位

    State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, the Chinese Academy of Sciences, Dalian 116023, PR China;

    State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, the Chinese Academy of Sciences, Dalian 116023, PR China;

    State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, the Chinese Academy of Sciences, Dalian 116023, PR China;

    State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, the Chinese Academy of Sciences, Dalian 116023, PR China;

    State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, the Chinese Academy of Sciences, Dalian 116023, PR China;

    State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, the Chinese Academy of Sciences, Dalian 116023, PR China;

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  • 正文语种 eng
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  • 关键词

    silica films; metal-oxide interfaces; X-ray photoelectron spectroscopy; ultraviolet photoelectron spectroscopy; high-resolution electron energy loss spectroscopy; scanning tunneling microscopy;

    机译：二氧化硅膜金属氧化物界面;X射线光电子能谱;紫外光电子能谱高分辨率电子能量损失谱;扫描隧道显微镜;

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