Protection of polymer from atomic-oxygen erosion using Al_2O_3 atomic layer deposition coatings

著录项

• 来源
  《Thin Solid Films》 |2008年第12期|4036-4039|共4页
• 作者

  Russell Cooper; Hari P. Upadhyaya; Timothy K. Minton; Michael R. Berman; Xiaohua Du; Steven M. George;

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• 作者单位

  Department of Chemistry and Biochemistry, Montana State University, Bozeman, MT 59717, USA;

  Department of Chemistry and Biochemistry, Montana State University, Bozeman, MT 59717, USA;

  Department of Chemistry and Biochemistry, Montana State University, Bozeman, MT 59717, USA;

  Air Force Office of Scientific Research, 875 N. Randolph Street, Arlington, VA 22203, USA;

  Departments of Chemistry and Biochemistry and Chemical and Biological Engineering, University of Colorado, Boulder, CO 80309, USA;

  Departments of Chemistry and Biochemistry and Chemical and Biological Engineering, University of Colorado, Boulder, CO 80309, USA;

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• 收录信息
• 原文格式 PDF
• 正文语种 eng
• 中图分类
• 关键词

  polymers; polyimide; atomic layer deposition; Al_2O_3; atomic oxygen; erosion; quartz crystal microbalance;

  机译：聚合物聚酰亚胺原子层沉积;Al_2O_3;原子氧侵蚀;石英晶体微量天平;