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Optimization Of Chemical Bath Deposited Cds Thin Films Using Nitrilotriaceticacid As A Complexing Agent

机译:硝酸三乙酸作为络合剂对化学浴沉积Cds薄膜的优化

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摘要

We report a design of experiment approach for the optimization of CdS thin films grown by chemical bath deposition using nitrilotriacetic acid (NTA) as a complexing agent. With the help of this approach, we developed a set of experiments that enabled us to maximize the growth rate. In comparison with works reported earlier/a much faster growth rate is achieved. Two different cadmium precursors; CdSO_4 and CdCl_2 were used in this work. Only NTA was used as a ligand for all films deposited on transparent conducting oxide coated soda lime glass substrates. CdS films deposited on quartz glass using only NTA peeled off, and became patchy. However, with the addition of hydrazine monohydrate, high quality CdS films were obtained on quartz glass.
机译:我们报告了一种实验方法的设计,该实验方法用于优化通过使用次氮基三乙酸(NTA)作为络合剂的化学浴沉积来生长的CdS薄膜。在这种方法的帮助下,我们开发了一组实验,使我们能够最大化增长率。与早期报道的作品相比,可以实现更快的增长率。两种不同的镉前体;在这项工作中使用了CdSO_4和CdCl_2。对于沉积在透明导电氧化物涂层的钠钙玻璃基板上的所有薄膜,仅将NTA用作配体。仅使用NTA沉积在石英玻璃上的CdS膜会剥落并变得不规则。但是,通过添加一水合肼,可以在石英玻璃上获得高质量的CdS膜。

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