Analysis of magnetron sputtered boron oxide films

Dalibor Buc; Igor Bello; Maria Caplovicova; Milan Mikula; Jaroslav Kovac; Ivan Hotovy; Yat Min Chong; Guei Gu Siu

首页> 外文期刊>Thin Solid Films >Analysis of magnetron sputtered boron oxide films

【24h】

Analysis of magnetron sputtered boron oxide films

机译：磁控溅射氧化硼薄膜的分析

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

Boron oxide films were grown on silicon substrates by radio-frequency (rf) unbalanced magnetron sputtering of a boron target in argon-oxygen gas mixtures with different compositions. Microscopic analyses show that overall boron oxide films are amorphous. The film prepared at oxygen/argon flow rate ratio ＞ 0.05 developed large crystallites of boric acid in localize areas of amorphous boron oxide matrices. These crystallites were unstable and at electron microscopic analysis they continuously transformed to a cubic HBO_2 phase and then completely vanished leaving an underlying amorphous boron oxide film behind. The analyses indicate the coexistence of B_6O, HBO_2 crystallites and amorphous boron oxide matrices. Fourier transform infrared (FTIR) spectra revealed spectral bands of BOH, BO, BOB and BH groups. Nanohardness and elastic modulus of a film prepared at low oxygen concentration approach 30 and 300 GPa, respectively. These parameters however vary with deposition conditions.

机译：通过射频（rf）不平衡磁控溅射硼靶在具有不同组成的氩氧气体混合物中在硅衬底上生长氧化硼膜。显微分析表明，整个氧化硼薄膜是非晶态的。氧气/氩气流量比＞ 0.05制备的薄膜在非晶态氧化硼基质的局部区域形成了硼酸大晶体。这些微晶是不稳定的，在电子显微镜下，它们不断转变为立方HBO_2相，然后完全消失，留下了下面的非晶态氧化硼膜。分析表明，B_6O，HBO_2微晶和无定形氧化硼基质共存。傅立叶变换红外（FTIR）光谱揭示了BOH，BO，BOB和BH基团的光谱带。在低氧浓度下制备的薄膜的纳米硬度和弹性模量分别接近30和300 GPa。然而，这些参数随沉积条件而变化。

著录项

来源
《Thin Solid Films》 |2007年第24期|8723-8727|共5页
作者
Dalibor Buc; Igor Bello; Maria Caplovicova; Milan Mikula; Jaroslav Kovac; Ivan Hotovy; Yat Min Chong; Guei Gu Siu;
展开▼
作者单位

Slovak University of Technology in Bratislava, Slovak Republic;

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类工程材料学;
关键词
scanning electron microscopy (SEM) (including EBIC); transmission electron microscopy (TEM) (including STEM; HRTEM; etc.); structure and morphology; thickness; crystalline orientation and texture; boron oxide; reactive magnetron sputtering;

机译：扫描电子显微镜（SEM）（包括EBIC）;透射电子显微镜（TEM）（包括STEM;HRTEM等）;结构和形态;厚度;晶体取向和质地;氧化硼反应磁控溅射;

相似文献

外文文献
中文文献
专利

1. Synthesis and characterization of single and multilaper boron nitride and boron carbide thin films grown by magnetron sputtering of boron carbide [J] . M.U. Guruz, V.P. Dravid, Y.W. Chung Thin Solid Films . 2002,第1期

机译：磁控溅射碳化硼制备单层和多层氮化硼和碳化硼薄膜的合成与表征
2. CHARACTERIZATION OF BISMUTH OXIDE THIN FILMS DEPOSITED VIA UNBALANCED MAGNETRON SPUTTERING ( CARACTERIZACIóN DE PELíCULAS DELGADAS DE OXIDO DE BISMUTO DEPOSITADAS MEDIANTE SPUTTERING CON MAGNETRON DESBALANCEADO ) [J] . Giovany Orozco-Hernández, Laura López-Córdoba, Helber Esquivel-Puentes, Revista Latinoamericana de Metalurgia y Materiales . 2017,第2期

机译：通过不平衡磁控溅射法沉积的氧化铋薄膜的特征。
3. High quality boron carbon nitride/ZnO-nanorods p-n heterojunctions based on magnetron sputtered boron carbon nitride films [J] . Qian J.C., Jha S.K., Wang B.Q., Applied Physics Letters . 2014,第19期

机译：基于磁控溅射氮化硼碳薄膜的高质量氮化硼碳/ ZnO-纳米共轭p-n异质结
4. Boron Doped Zinc Oxide Films Grown by DC Reactive Magnetron Sputtering [C] . L. Pholds, M. E. Samiji, N. R. Mlyuka, European Photovoltaic Solar Energy Conference and Exhibition . 2013

机译：直流反应磁控溅射生长的掺硼氧化锌薄膜
5. Boron Nitride Thin-Film Deposited by RF Magnetron Sputtering [D] . Valladaares Gonzalez, Jesus A. 2018

机译：硼氮化硼薄膜沉积在RF磁控溅射
6. Spatially Resolved Optoelectronic Properties of Al-Doped Zinc Oxide Thin Films Deposited by Radio-Frequency Magnetron Plasma Sputtering Without Substrate Heating [O] . Eugen Stamate 2020

机译：在不加热衬底的情况下通过射频磁控等离子体溅射沉积的铝掺杂氧化锌薄膜的空间分辨光电性能
7. Reactive sputtering of delta-ZrH2 thin films by high power impulse magnetron sputtering and direct current magnetron sputtering [O] . Högberg, Hans, Tengdelius, Lina, Samuelsson, Mattias, 2014

机译：高功率脉冲磁控溅射和直流磁控溅射反应溅射ZrH2薄膜

Analysis of magnetron sputtered boron oxide films

摘要

著录项

相似文献

相关主题

期刊订阅