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Durable TiN/TiN_x metallic contacts for solar cells

机译：耐用的TiN / TiN_x金属触点用于太阳能电池

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摘要

A new structure of durable metallic thin film contacts for solar cells has been investigated. Stoichiometric titanium nitride (TiN) with a thin non-stoichiometric titanium nitride (TiN_x) buffer layer was used to give the desirable mechanical properties and metallic behavior. The metallic contacts were deposited by dc reactive magnetron sputtering using negative rf bias voltage on glass substrates. The target was Ti (99.95% purity) and the reactive gas was N_2 (99.999% purity). In situ and ex situ spectroscopic ellipsometry (SE) was employed to study the metallic behavior of the deposited thin films in terms of unscreened plasma energy ω_(pu) of the material. The study showed that TiN/TiN_x films exhibited the same, good metallic behavior with TiN films. The cohesion and the adhesion of the TiN and TiN_x to the glass substrate were investigated by employing scratch test and lateral force measurements. It was found that all the investigated metallic contacts remain cohered during the scratch test, but only the proposed TiN/TiN_x metallic contact stayed adhered to the substrate. Thus, improved service life together with high performance is expected for the solar cells based on the proposed metallic contacts.
机译：已经研究了用于太阳能电池的耐用金属薄膜触点的新结构。具有薄的非化学计量的氮化钛（TiN_x）缓冲层的化学计量的氮化钛（TiN）用于提供所需的机械性能和金属性能。通过使用负rf偏置电压的直流反应磁控溅射在玻璃基板上沉积金属触点。目标为Ti（纯度为99.95％），反应气体为N_2（纯度为99.999％）。就材料的未屏蔽等离子体能量ω_（pu）而言，采用原位和非原位光谱椭圆仪（SE）研究沉积薄膜的金属性能。研究表明，TiN / TiN_x膜表现出与TiN膜相同，良好的金属性能。 TiN和TiN_x对玻璃基板的内聚力和粘附力通过划痕测试和横向力测量进行了研究。发现所有研究的金属触点在划痕测试期间保持粘结，但是只有建议的TiN / TiN_x金属触点保持粘附在基板上。因此，基于所提出的金属触点，期望太阳能电池具有改善的使用寿命以及高性能。

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