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Low pressure deposition of Li_xZn_yO thin films by means of RF plasma jet system

机译：射频等离子体射流系统低压沉积Li_xZn_yO薄膜

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Low pressure RF hollow cathode plasma jet system was used for deposition of Li_xZn_yO thin films. Hollow cathode discharge was excited by either CW or pulse modulated RF power. Reactive sputtering of composed hollow cathode in Ar and O_2 was used for that purpose. One part of the nozzle was made of sintered Li_2ZnO_2 and the second one of pure metallic zinc. Chemical composition of deposited films was determined by atomic absorption spectroscopy. It was found that the ratio of Li and Zn atoms in the films was possible to change from 0.04 to 1.41 and it was dependent on the deposition conditions. Structure and orientation of crystallites were checked by XRD in Bragg-Brentano geometry. Hexagonal structure of ZnO crystallites was identified in deposited films. Basically, the plane 001 had preferred orientation parallel to the substrate surface ('c' axis perpendicular to the substrate surface). Photoluminescence was studied on the deposited samples as well. Parameters of the plasma jet and sputtered atoms were investigated by 'in situ' emission spectroscopy.
机译：低压RF空心阴极等离子体喷射系统用于沉积Li_xZn_yO薄膜。空心阴极放电通过连续波或脉冲调制射频功率激发。为此目的，使用了在Ar和O_2中组成的空心阴极的反应溅射。喷嘴的一部分由烧结的Li_2ZnO_2制成，第二部分由纯金属锌制成。沉积膜的化学组成通过原子吸收光谱法测定。已经发现，膜中Li和Zn原子的比例可以从0.04变为1.41，这取决于沉积条件。通过XRD检查布拉格-布伦塔诺几何形状的微晶的结构和取向。 ZnO微晶的六边形结构在沉积膜中被确定。基本上，平面001具有平行于基板表面的优选取向（垂直于基板表面的“ c”轴）。还对沉积的样品研究了光致发光。通过“原位”发射光谱研究了等离子体射流和溅射原子的参数。

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