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New developments in X-ray fluorescence metrology

机译:X射线荧光计量学的新发展

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摘要

A new micro-spot XRF metrology tool has been developed that enables on-product production control of films and stacks used in the semiconductor and data storage industry. The tool has been evaluated using several thin films and stacks and the initial results verify the suitability of this micro-spot XRF method as an in-line metrology technique. Both the classical XRF analysis method as well as the fundamental parameter approach proved to be applicable. The successful combination of micro-spot excitation and fundamental parameter analysis makes the technique a powerful method for on-product characterization of single films and multi-layers.
机译:已经开发出一种新的微点XRF计量工具,该工具可以对半导体和数据存储行业中使用的薄膜和叠层进行产品生产控制。该工具已使用多个薄膜和叠层进行了评估,初步结果验证了这种微点XRF方法作为在线计量技术的适用性。经典的XRF分析方法和基本参数方法都被证明是适用的。微点激发和基本参数分析的成功结合使该技术成为单层膜和多层膜产品表征的强大方法。

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