Effect of substrate temperature and deposited thickness on the formation of iron silicide prepared by ion beam sputter deposition

K. Yamaguchi; M. Haraguchi; T. Katsumata; K. Shimura; H. Yamamoto; K. Hojou

首页> 外文期刊>Thin Solid Films >Effect of substrate temperature and deposited thickness on the formation of iron silicide prepared by ion beam sputter deposition

【24h】

Effect of substrate temperature and deposited thickness on the formation of iron silicide prepared by ion beam sputter deposition

机译：衬底温度和沉积厚度对离子束溅射沉积制备硅化铁的影响

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

Ion beam sputter deposition (IBSD) method was employed to find optimum conditions for the formation of epitaxial β-FeSi_2 films on Si(100) substrate. It was found that crystal structure of the films as determined by X-ray diffraction (XRD) analysis is dependent on the substrate temperature as well as on the deposited thickness of sputtered Fe. The film with best crystal properties was obtained either at 873 K with the deposited Fe thickness of 15 nm, or at 973 K with the deposited Fe thickness of 30 nm. The obtained results indicate the importance of Fe and/or Si diffusion in determining the crystal properties of β-FeSi_2 film.

机译：离子束溅射沉积（IBSD）方法用于寻找在Si（100）衬底上形成外延β-FeSi_2薄膜的最佳条件。已经发现，通过X射线衍射（XRD）分析确定的膜的晶体结构取决于衬底温度以及溅射的Fe的沉积厚度。在873 K下沉积的Fe厚度为15 nm或在973 K下沉积的Fe厚度为30 nm时，可以获得具有最佳晶体性能的薄膜。所得结果表明Fe和/或Si扩散对确定β-FeSi_2膜的晶体性质的重要性。

著录项

来源
《Thin Solid Films》 |2004年第1期|p.13-16|共4页
作者
K. Yamaguchi; M. Haraguchi; T. Katsumata; K. Shimura; H. Yamamoto; K. Hojou;
展开▼
作者单位

Tokai Research Establishment, Japan Atomic Energy Research Institute, 2-4 Shirakata-Shirane, Tokai-mura, Ibaraki-ken 319-1195, Japan;

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类工程材料学;
关键词
ion beam sputter deposition; β-FeSi_2; crystal structure;

机译：离子束溅射沉积;β-FeSi_2;晶体结构;

相似文献

外文文献
中文文献
专利

1. Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams [J] . Tanaka M, Chu F, Shimojo M, Journal of Materials Science . 2006,第9期

机译：电子束下金属有机化学气相沉积法在硅衬底上形成硅化铁纳米岛
2. Formation of iron silicide nano-islands on Si substrates by metal organic chemical vapor deposition under electron beams [J] . M. Tanaka, F. Chu, M. Shimojo, Journal of Materials Science . 2006,第9期

机译：电子束下金属有机化学气相沉积法在硅衬底上形成硅化铁纳米岛
3. Effects of magnesium film thickness and annealing temperature on formation of Mg_2Si films on silicon (111) substrate deposited by magnetron sputtering [J] . Qingquan Xiao, Quan Xie, Xiangqian Shen, Applied Surface Science . 2011,第17期

机译：镁膜厚度和退火温度对磁控溅射在硅（111）衬底上形成Mg_2Si膜的影响
4. Effect of Sputtered Ti thickness and Post Deposition Annealing Temperature on The Formation of Ti_5Si_4 Nanocrystal on Si via Direct-Deposit Self-Assembly Method [C] . H. J. Lee, K. Y. Cheong 11th international conference on electronic materials and packaging 2009 . 2009

机译：直接沉积自组装方法溅射Ti厚度和沉积后退火温度对Si上Ti_5Si_4纳米晶形成的影响
5. Characterization of Indium Zinc Oxide, Indium Tin Oxide, and Molybdenum Thin Films on Flexible Glass Substrates Deposited via Roll-to-roll Sputter Deposition Processes [D] . Bezama, Christian. 2019

机译：通过轧制溅射沉积工艺沉积在柔性玻璃基板上的氧化铟锌，氧化铟锡和钼薄膜的表征
6. Effect of Target Composition and Sputtering Deposition Parameters on the Functional Properties of Nitrogenized Ag-Permalloy Flexible Thin Films Deposited on Polymer Substrates [O] . Waheed Khan, Qun Wang, Xin Jin 2018

机译：靶成分和溅射沉积参数对沉积在聚合物基底上的氮化银-坡莫合金柔性薄膜功能性能的影响
7. Effect of Irradiation Atmospheres on the Film Growth of Iron Oxide on Si Substrate by Ion Beam Sputter Deposition Method [O] . K. Yamanaka, K. Yamaguchi 2020

机译：离子束溅射沉积法对氧化铁氧化铁膜生长的辐照气氛对辐射气氛的影响

Effect of substrate temperature and deposited thickness on the formation of iron silicide prepared by ion beam sputter deposition

摘要

著录项

相似文献

相关主题

期刊订阅