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首页> 外文期刊>Transactions of Nonferrous Metals Society of China >Oxide film on equiatomic TiNi shape memory alloy
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Oxide film on equiatomic TiNi shape memory alloy

机译：等原子TiNi形状记忆合金上的氧化膜

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摘要

By means of scanning electron microscopy, X-ray diffraction and X-ray photoelectron spec- troscopy, the oxide layers on equiatomic TiNi shape memory alloy oxidized in the temperature range from room temperature to 800 deg. C were studied. The results showed that the thin oxide film naturally formed at room temperature contains Ti element in TiO_2 state and part of Ni element in Ni_2O_3 state, leaving other Ni still in metallic state; The thin oxide films formed at 300～500 deg. C are characterized by enriched Ti and depleted Ni, both in completely oxidized state. Thick scaling layers were formed above 700 deg. C, which are proved to be composed of an outer TiO_2 layer dissolved by small amount of Ni and an inner pure Ni_3Ti layer.
机译：通过扫描电子显微镜，X射线衍射和X射线光电子能谱，等原子TiNi形状记忆合金上的氧化层在室温至800度的温度范围内被氧化。 C进行了研究。结果表明，在室温下自然形成的氧化膜含有TiO_2状态的Ti元素和Ni_2O_3状态的一部分Ni元素，其余Ni仍处于金属状态。在300〜500度形成氧化薄膜。 C的特征是富钛和贫镍都处于完全氧化状态。在700度以上形成厚的氧化皮层。 C，被证明是由少量的Ni溶解的TiO_2外层和内部的纯Ni_3Ti层组成。

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