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Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis

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1.Titanium oxide CVD from titanium (IV) nitrate and titanium (IV) isopropoxide: growith kinetics, film morphology and precursor specific effects

机译：来自钛（IV）硝酸钛和钛（IV）异丙氧化物的钛氧化钛CVD：恶魔动力学，薄膜形态和前体特异性效果
- 作者：Charles J.Taylor;David Gilmer;Wayne L.Gladfelter;Stephen Camphen Campbell;Jeffrey T.Roberts;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
2.In-situ studies of tin oxide CVD on glass substrates using raman spectroscopy

机译：使用拉曼光谱法在氧化锡CVD对玻璃基材的原位研究
- 作者：I.P.OHare;M.E.Pemble;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
- tin oxide;
- CVD;
- Raman;
- surface;
- Eley-Rideal;
3.Ygbco film orientation dependence on barium composition

机译：ygbco胶片取向依赖钡组成
- 作者：J.Santiso;M.Doundkowsky;A.Figueras;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
4.Atomic-layer adsorption of a on Si(100) by using ultraclean lpcvd

机译：通过使用Ultraclean LPCVD在Si（100）上的原子层吸附
- 作者：Yosuke Shimamune;Masao Sakuraba;Takashi Matsuura;Junichi Murota;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
5.Far-infrared RAIRS studies of the adsorption of chlorometylsilanes on carbon and tungsten surfaces.

机译：远红外骑行对碳和钨表面上氯化氯硅烷的吸附研究。
- 作者：R.kausar A.Awalludiin;L.He;M.E.Pemble;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
- CVD;
- RAIRS;
- DCMS;
- TCMS;
- Synchrotron Radiation;
- silicon carbide;
6.A model for simulating the development of morphology during diamon CVD

机译：模拟DIAMIN CVD中形态学的模型
- 作者：Ronald C.Brown;Jeffrey T.Roberts;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
7.Photochemical pattern etching of SiC with NF_3

机译：使用nf_3的SiC的光化学模式蚀刻
- 作者：T.Mori;M.Murahara;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
8.Surface modification of glass by vaporization reactions

机译：通过汽化反应的玻璃表面改性
- 作者：K.E.Spear;M.N.Palmisiano;C.G.Pantano;T.M.Besmann;E.C.Beahm;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
9.DOminant chemical reaction and species for silicon epitaxial growth in a SiHCl_3-H2 system at atmospheric pressure in a horizontal cold-wall reactor

机译：在水平冷壁反应器中大气压下SiHCL_3-H2系统中硅外延生长的主导化学反应和物种
- 作者：H.Habuka;S.Akiyama;T.Otasuka;M.SHimada;K.Okuyama;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
10.Metal dialkyldithiocarbamates as mocvd precursors: thermodynamic properties and crystal lattice energy

机译：金属Dialkydithiocarbamates作为MoCVD前体：热力学性质和晶格能量
- 作者：Svetlana M.Zemskova;Pavel A.Stabnikov;Sergey V.Susoev;Igor K.Igumenov;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
11.Amorphous hydrogenated SiC films produced by a dual/mixed frequency plasma-enhanced CVD reactor

机译：通过双/混合频率等离子体增强的CVD反应器生产的无定形氢化SiC膜
- 作者：H.M.Liaw;P.Williams;N.Cave;P.Deal;N.Saha;Rich Gregory;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
12.Morphological instability of CdTe deposited by organometallic vapor phase epitaxy

机译：有机金属气相外延沉积的CDTE的形态不稳定性
- 作者：K.Yong;P.J.Sides;A.J.Gellman;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
13.Interfacial reactions for chemical vapor deposition of Ir and Pt films on silicon dioxide and barium-strontium titanate substrates

机译：二氧化硅和钛酸钡衬底上的IR和Pt膜的化学气相沉积的界面反应
- 作者：Y.-M.Sun;J.Lozano;J.Endle;J.Ekerdt;J.M.Wite;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
14.Tantalum conating of steel, copper, aluminum, and titanium by thermal chemical vapor deposition (CVD)

机译：通过热化学气相沉积（CVD）钢，铜，铝和钛的钽混凝（CVD）
- 作者：S PHI ren Eriksen;Erik Christensen;Niels J.Bjerrum;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
15.Electrochemical evaluation of pyrite films prepared by plasma spraying

机译：等离子体喷涂制备的硫铁矿膜的电化学评价
- 作者：Ronald A.Guidotti;Frederick W.Reinhardt;Hui Ye;Chris;Strock;T.Danny Xiao;David E.Reisner;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
16.Titanium-manin group chemistry

机译：钛 - 人类组化学
- 作者：Mark S.Gordon;Brett M.Bode;Takako Kudo;Gyusung Chung;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
17.In situ studies of teos/ozone CVD: experimental considerations for probing reactions in commercial CVD equipment

机译：TEOS /臭氧CVD的原位研究：商业CVD设备中探测反应的实验考虑因素
- 作者：Thomas K.Whidden;SUn Young Lee;Xiaoyi Bao;Michel COuturier;James Taylor;Ping Lu Sebstien Romet;Zhao Xiaozhong;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
18.Etch kinetics of polyphenylene oxide laminates usikng a CF_4/O_2 downstream microwave plasma

机译：蚀刻聚环氧化物层压板USIKNG A CF_4 / O_2下游微波等离子体
- 作者：Kevin C.Hsu;Milo D.Koretsky;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
- microwave plasma;
- etching;
- mass spectrometry;
- polyphenylene oxide, X-ray photoelectron spectroscopy.;
19.Synthesis and decomposition kinetics of liquid precursors for chemical vapor deposition (CVD) of barium

机译：钡化学气相沉积（CVD）液体前体的合成与分解动力学
- 作者：Roy G.Gordon;Sean T.Barry;Randy N.R.Broomhall-Dillard;Nicholas DiCeglie;Xinye Liu;Daniel J.Teff;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
20.Gas phase chemistry in chemical vapro depossition

机译：使用气体面部化学化学替代
- 作者：Robert W.Carr;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
21.Structure of compound semiconductors surfaces in the movpe enviroonment

机译：化合物半导体表面在电影环境中的结构
- 作者：B.-K.Han;L.Li;M.J.Begarney;D.Law;Q.Fu;R.F.Hicks;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
22.Numerical modeling of gas-phase nucleation and particle growth during chmical vapor deposition of silicon

机译：硅气相核沉积过程中气相成核和颗粒生长的数值模拟
- 作者：S.L.Girshick;M.T.Swithart;S.-M.Suh;M.R.Mahajan;S.Nijhawan;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
23.Atomic-scale modeling of plasma-surface intractions in the pecvd of silicon

机译：硅PECVD中等离子体表面相互作用的原子尺度建模
- 作者：Dimitrios Maroudas;Shyam Ramalingam;Eray.S.Aydil;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
24.Dynamic optimization of chemically reacting stagnation flows

机译：化学反应滞销流动的动态优化
- 作者：Laxminarayan L.Raja;Rober J.kee;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
25.In situ monitoring of CVD for HTS growth

机译：在SITU监测CVD的HTS增长
- 作者：Guglielmo G.COndorelli;Michael L.Hitchman;Alexei Y.Kovalgin;Sarkis H.Samlian;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
26.Experimental gas-phase kinetics for parallel-plate pecvd

机译：平行板PECVD实验气相动力学
- 作者：Phillip R.Westmoreland;Pierre-andre BUi;I.Bradford Graff;Dionisios G.Valchos;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
27.Surface stoichometry, structure, and kinetics of gaas mocvd

机译：Gaas Mocvd的表面化学计量，结构和动力学
- 作者：J.R.Creighton;H.K.Moffat;K.C.Baucom;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
28.Detailed analysis of a kinetic mechanism for diamond growith in oy-acetylene combustion CVD

机译：氧 - 乙炔燃烧CVD金刚石生长动力学机制的详细分析
- 作者：M.Okkerse;M.H.J.M.de Croon;C.R.Kleijn;G.B.Marin;H.E.A.v.d.Akker;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
29.TShermodynamic modeling of silicon lpcvd revisited with kinetic data

机译：具有动力学数据的硅LPCVD的Tshermocynamic建模
- 作者：Elisabeth Blandquet;Constantin Vahlas;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
30.A computational chemistry database for semiconductor processing

机译：用于半导体处理的计算化学数据库
- 作者：Richard Jaffe;M.Meyyappan;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
31.Three-dimensional simulation of gas flow in a disk-type silicon epitaxial reactor

机译：磁盘式硅外延反应器中气流的三维模拟
- 作者：Akihiro Miyauchi;Yousuke Inoue;TSakaya Suzuki;Minoru Sakamoto;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
32.Photo induced hydrophilic treatment of porous flouropholymer film by using H_2O vapor

机译：通过使用H_2O蒸汽诱导多孔荧光多孔膜的亲水性处理
- 作者：S.Ito;M.Murahara;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
33.Atomic-order nitridation of Si by radical-and ion-induced reactions using an ultraclean ECR nitrogen plasma

机译：使用超薄ECR氮等离子体的自由基和离子诱导的Si的原子序硝化
- 作者：Takuya Seino;Takashi Matsuura;Junichi Murota;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
34.Sio flame emission spectroscopy from a silane/hydrogen/oxygen/argon diffusion flame

机译：来自硅烷/氢气/氧气/氩气扩散火焰的SiO火焰发射光谱
- 作者：M.S.Wooldridge;S.A.Danczyk;J.Wu;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
35.Gas phase and surface reactions in C_2F_4 glow discharge polymerization

机译：C_2F_4辉光放电聚合中的气相和表面反应
- 作者：E.G.Loh;Y.Simogaki;H.Komiyama;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
36.Two-dimensional simulation of the growth enhancement in selective area metal-organic vapor phase epitaxy

机译：选择性区域金属 - 有机气相外延的生长增强二维模拟
- 作者：Y.Mishima;N.Kaida;M.Sugiyama;Y.Shimogaki;Y.nakano;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
37.Laser pyrolysis studies of gas-phase CVD reactions

机译：激光热解的气相CVD反应研究
- 作者：Douglas K.Russell;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
38.Thermodynamics and kinetics of Gas-phase reactions in the TSi-C-Cl-H system

机译：TSI-C-CL-H系统中气相反应的热力学和动力学
- 作者：Francis Tesyssandier;Mark D.Allendorf;Andrew Ho;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
39.A kinetic model for the mocvd of Cd-Te

机译：CD-TE MOCVD动力学模型
- 作者：Carlo Cavallotti;Cecilia Medeossi;Caterina Turconi;Maurizio Masi;Sergio Carra;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
40.THin film growth of titanium and titanium nitride via gas-phase reaction of sodium vapor with titanium tetrachloride

机译：钛膜生长钛和氮化钛的钠蒸气与四氯化钛的气相反应
- 作者：Jay H.hendricks;Maria Iaquino;Michael R.Zachariah;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
41.Simulation of hot-wire chemical vapor deposition of hydrogenated amorphous silicon

机译：氢化非晶硅的热线化学气相沉积模拟
- 作者：D.G.Goodwin;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
42.Preliminary results of low-temperature deposition of nanotubes usikng aerosol-assisted chemical vapor deposition

机译：纳米管低温沉积的初步结果USIKNG气溶胶辅助化学气相沉积
- 作者：Dario narducci;Luca Toselli;Paolo Milani;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
43.Chemical vapour deposition of pyrolytical carbon and graded C/SiC/Si-films at atomspheric pressure

机译：热解碳和梯度C / SiC / Si-膜在大气压下的化学气相沉积
- 作者：N.Popovska;D.Held;V.Wunder;H.Gerhard;G.Emig;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
44.Atomic-layer nitridation of Si(100) by NH_3 using flash heating

机译：使用闪蒸加热通过NH_3的Si（100）的原子层氮化
- 作者：Takeshi Watanabe;Masao Sakuraba;Takashi Matsuura;Junichi Murota;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
45.Reaction products of Al-CVD from dimethyl-aluminumhydride observed by infrared spectroscopy

机译：由红外光谱观察二甲基铝酐的Al-CVD的反应产物
- 作者：M.Sugiyama;Y.Shimogaki;H.Itoh;J.Aoyama;T.Yoshimi;H.Komiyama;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
46.Study of hafnium carbide growth by CVD from in situ chlorinated ha nium

机译：CVD从原位氯化HA Ni利研究CVD的碳化铪生长
- 作者：V.K.Wunder;N.Popovsak;G.Emig;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
47.Single pulse shock tube studies on disilane decomposition

机译：单脉冲冲击管研究脂质化分解
- 作者：Wing Tsang;juergen Herzler;Jeffrey A.Manion;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
48.Defintive movpe mechanisms from studies of labelled precursors

机译：标记前体研究的定义电影机制
- 作者：Nigel L.Pickett;Douglas F.Foster;David J.Cole-Hamilton;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
49.Chemical kinetics for modeling silicon epitaxy from chlorosilanes

机译：用于氯硅烷硅外延的化学动力学
- 作者：Pauline Ho;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
50.G2 predictions of group III thermochemistry: compounds containing aluminum

机译：III族热化学的G2预测：含铝化合物
- 作者：Kark D.Allendorf;Carl F.melius;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
51.TShermal decomposition mechanism o f Ti(O-iPr)_2 (DPM)_2

机译：F TI（IPR）_2（DPM）_2的Tsheress分解机制
- 作者：Hyun-Kyu Ryu;Jung Shik Heo;Sung-Il Cho;Sang Heup Moon;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
52.Preparation of Y_2O-3 stabilized ZrO_3 (YSZ)_ thin films by a microwave plasma mocvd

机译：用微波等离子体MOCVD制备Y_2O-3稳定的ZrO_3（YSZ）_薄膜
- 作者：K.Itoh;K.Mitani;O.Matsumoto;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
53.Investigation of nickelocene decomposition during CVD of nickel

机译：镍CVD期间镍茂分解的研究
- 作者：Riadh Sahnoun;Laurent Brissonneau;Catalin Rotaru;Claude Mijoule;Constantin Vahlas;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
54.Kinetics of gas-phase reactions in the SI-H system

机译：Si-H系统中的气相反应动力学
- 作者：Sylvie Rouquet;Alain Dollet;Francis Teyssandier;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
55.A density functional theory study of chemical vapor depsotion of copper from (hfac) CuL compounds

机译：铜化学气相沉积（HFAC）CUL化合物的密度泛函理论研究
- 作者：Carlo Cavallotti;Klavs F.Jensen;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
56.Macroscopic modeling for vapro deposition processes: from purely thermodynamic to coupled heat/mass transfer-thermodynamic models

机译：VAPRO沉积工艺的宏观造型：从纯粹的热力学到耦合热/质量转移 - 热力学模型
- 作者：E.Blanquet;M.Pons;C.Bernard;R.Madar;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
57.Formation of transparent SiO_2 thin film at room temperature with 172nm Xe_2~ centre dot excimer lamp irradiation

机译：在室温下形成透明SiO_2薄膜，172NM XE_2〜中心点准分灯照射
- 作者：H.Iizuka;M.Murahara;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
58.The pyrolitic behavior of trimentylindium flow-tube reactors

机译：三甲基氨基流量 - 管反应器的热解作用
- 作者：Anthony H.McDaniel;Mark D.Allendorf;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
59.Thermodynamic assessment of C_(70) and investigation of the fabrication process of fullerenes

机译：C_（70）的热力学评估及富勒烯制造过程的研究
- 作者：Constantin Vahlas;Alina Kacheva;Michael L.Hitchman;Philippe Rocabois;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
60.Reaction patheays in organometallic chemical vapor depositioon of AlGaN

机译：AlGaN有机金属化学气相沉积的反应途径
- 作者：Vijay Gupta;Istvan Lengyel;Theodoros G.Mihopoulos;Klavs F.jensen;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
61.Chemical vapor deposition of silica films from silanepoxygen mixtures in a cold-wall reactor

机译：从冷壁反应器中硅氧烷混合物的二氧化硅膜的化学气相沉积
- 作者：F.Ojeda;J.M.Albella;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
62.Fluorination of polyimide sheet surface by using Xe_2~ centre dot excimer lamp and CF_4

机译：通过使用XE_2〜中心点准分灯和CF_4氟化聚酰亚胺板表面
- 作者：T.Ikegame;M.Murahara;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
63.A numerical analysis of mass transport in the stagnation flow geometry

机译：停滞流动几何质量运输的数值分析
- 作者：Jie zhou;Colin a.Wolden;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
64.SThe influence of substrate properties upon the epitaxial layer

机译：基材特性对外延层的影响
- 作者：M.Imai;M.Maysumi;K.Inoue;S.Nakahara;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
65.Deposition scheme of GaN thin films by microwave plasma mocvd

机译：微波等离子体MOCVD沉积GaN薄膜的沉积方案
- 作者：N.Ihashi;K.Itoh;O.Matsumoto;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
66.Photochemical formation of Cu thin films on polyimide surface using ArF excimer Laser

机译：使用ARF准分子激光器聚酰亚胺表面Cu薄膜的光化学形成
- 作者：M.Tomita;M.Murahara;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
67.An investigation of boron precursor influence on silicon oxide deposition kinetics using silane-oxygen and teos-oxygen mixtures at low pressure

机译：低压下硅烷氧和Teos-氧混合物对氧化硅沉积动力学对氧化硅沉积动力学的研究
- 作者：V.Y.Vassiliev;T.G.Duhanova;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年
68.In situ study of laser-assisted gas-phase reactivity in constrained gas pulse expansions of TMGa and TEGa with HN_3

机译：原位研究激光辅助气相反应性在TMGA和TEGA的约束气体脉冲扩展与HN_3
- 作者：Alexander Demchuk;John Porter;Brent Koplitz;Electrochemical Society Inc.
- 会议名称：《Symposium on fundamental gas-phase and surface chemistry of vapor-phase materials synthesis》 | 1999年