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首页> 外文期刊>Plasma physics and controlled fusion >Polymorphous silicon thin films produced in dusty plasmas: application to solar cells
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Polymorphous silicon thin films produced in dusty plasmas: application to solar cells

机译：多尘等离子体中产生的多晶硅薄膜：在太阳能电池中的应用

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摘要

We summarize our current understanding of the optimization of PIN solar cells produced by plasma enhanced chemical vapour deposition from silane hydrogen mixtures. To increase the deposition rate, the discharge is operated under plasma conditions close to powder formation, where silicon nanocrystals contribute to the deposition of so-called polymorphous silicon thin films. We show that the increase in deposition rate can be achieved via an accurate control of the plasma parameters. However, this also results in a highly defective interface in the solar cells due to the bombardment of the P-layer by positively charged nanocrystals during the deposition of the I-layer. We show that decreasing the ion energy by increasing the total pressure or by using silane-helium mixtures allows us to increase both the deposition rate and the solar cells efficiency, as required for cost effective thin film photovoltaics.
机译：我们总结了当前对由硅烷氢混合物进行等离子体增强化学气相沉积制得的PIN太阳能电池最优化的理解。为了增加沉积速率，在接近粉末形成的等离子体条件下进行放电，其中硅纳米晶体有助于所谓的多晶硅薄膜的沉积。我们表明，可以通过精确控制等离子体参数来实现沉积速率的增加。然而，由于在I层的沉积过程中带正电的纳米晶体对P层的轰击，这也导致太阳能电池中的界面高度缺陷。我们表明，通过增加总压力或使用硅烷-氦气混合物来降低离子能量，可以使我们提高沉积速率和太阳能电池效率，这是具有成本效益的薄膜光伏电池所必需的。

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