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Novel Potassium Sodium Niobate/Polyimide Functional Composite Films With High Dielectric Permittivity

机译:高介电常数的新型铌酸钾钠/聚酰亚胺功能复合膜

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摘要

This work reports the advanced potassium sodium nio-bate (K_(0.5)Na_(0.5)NbO3, KNN)/polyimide (KNN/PI) functional hybrid films with 5 vol%, 10 vol%, 20 vol%, 30 vol%, and 40 vol% KNN loaded. The structure, morphology, and dielectric properties of hybrid films have been measured. The results show that the KNN fillers are well dispersed in the PI matrix. An internal boundary layer capacitance structure is formed in the composite films. The dielectric permittivity of the film is as high as 22 when the concentration of KNN filler reaches 40 vol% at 10~2 Hz, which is five times larger than that of a pure PI matrix. Meanwhile, the loss tangent is lower than 0.05. in addition, the conductivity is lower than 10~(-8) (S m~(-1)) at 10~2 Hz, which indicates the excellent insulation and is important for the practical use of this kind of KNN/PI hybrid films. It is believed that the KNN/PI hybrid films could be applied in future electronic fields.
机译:这项工作报告了先进的铌酸钾钠(K_(0.5)Na_(0.5)NbO3,KNN)/聚酰亚胺(KNN / PI)功能杂化膜,分别具有5%,10%,20%,30%,和40 vol%的KNN加载。已经测量了杂化膜的结构,形态和介电性能。结果表明,KNN填料很好地分散在PI基质中。在复合膜中形成内部边界层电容结构。当KNN填料的浓度在10〜2 Hz时达到40 vol%时,薄膜的介电常数高达22,这是纯PI基质的五倍。同时,损耗角正切小于0.05。此外,在10〜2 Hz时电导率低于10〜(-8)(S m〜(-1)),这表明其优异的绝缘性,对于此类KNN / PI杂化膜的实际应用非常重要。相信KNN / PI混合膜可以应用于未来的电子领域。

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