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Near Field Investigation of a Plasmonic Luneburg Lens

机译:等离子Luneburg镜头的近场研究

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摘要

In this work, we investigate the interaction of surface plasmons with a plasmonic Luneburg lens using near field scanning optical microscopy. Gray-scale electron beam lithography is used to prepare a dome-shaped resist structure on top of a gold film. This particular shape yields the effective refractive index profile of a Luneburg lens for surface plasmons propagating at the film surface at an energy of eV. Next to the Luneburg lens a grating coupler is milled into the gold film with focused ion beam. The surface plasmons are launched to propagate through the lens and the near field pattern is scanned. We clearly identify a focal spot in the near field signal at the outer perimeter of the lens. In addition, we observe a beating pattern arising from further plasmon waves excited by higher orders of the grating coupler. The emergence of this beating pattern allows the detection of the plasmon's wave fronts. An analytical model was used to retrieve the properties of the participating wave components. The measured near-field pattern could be modeled very well with electromagnetic simulations applying the effective refractive index approach.
机译:在这项工作中,我们使用近场扫描光学显微镜研究表面等离激元与等离子Luneburg透镜的相互作用。灰度电子束光刻用于在金膜的顶部制备圆顶形抗蚀剂结构。该特定形状产生了Luneburg透镜的有效折射率分布,该Luneburg透镜对于以eV能量在膜表面传播的表面等离激元是有效的。在Luneburg透镜旁边,将光栅耦合器通过聚焦离子束研磨成金膜。发射表面等离子体激元以传播通过透镜,并扫描近场图案。我们清楚地确定了透镜外围的近场信号中的焦点。此外,我们观察到由更高阶的光栅耦合器激发的其他等离激元波引起的跳动模式。这种跳动模式的出现允许检测等离子体激元的波阵面。使用分析模型来检索参与波分量的属性。可以使用有效折射率方法通过电磁模拟对所测得的近场模式进行很好的建模。

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