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首页> 外文期刊>Plasma Sources Science & Technology >Localized electron heating and density peaking in downstream helicon plasma
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Localized electron heating and density peaking in downstream helicon plasma

机译：下游螺旋等离子体中的局部电子加热和密度峰值

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摘要

Localized electron temperature and density peaking at different axial locations in the downstream helicon plasma have been observed in a linear helicon device with both geometrical and magnetic expansion. The discharge is produced with an m = +1 right helical antenna powered by a RF source operating at 13.56 MHz. Axial wave field measurement shows the presence of damped helicon waves with standing wave character folded into it even at low densities (similar to 10(16) m(-3)). The measured helicon wavelength is just about twice the antenna length and the phase velocity (v(p)) is almost the speed required for electron impact ionization. These experimental observations strongly advocate the Landau damping heating and density production by the helicon waves, particularly in low density plasma such as ours. The electron temperature maximizes at 35-45 cm away from the antenna center in our experiments indicating a local source of heating at those locations. Different mechanisms responsible for this additional heating at a particular spatial location have been discussed for their possible roles. Further downstream from the location of the maximum electron temperature, a density peak located 55-65 cm away from the antenna is observed. This downstream density peaking can be explained through pressure balance in the system.
机译：在具有几何和磁性膨胀的线性螺旋装置中已经观察到下游螺旋等离子体中不同轴向位置处的局部电子温度和密度峰值。放电是通过m = +1右螺旋形天线产生的，该螺旋形天线由工作在13.56 MHz的RF源供电。轴向波场测量显示即使在低密度下（类似于10（16）m（-3）），也存在带有折叠的驻波特性的阻尼螺旋波。测得的螺线管波长大约是天线长度的两倍，而相速度（v（p））几乎是电子碰撞电离所需的速度。这些实验性观察强烈提倡利用螺线管波进行Landau阻尼加热并产生密度，特别是在像我们这样的低密度等离子体中。在我们的实验中，电子温度在距天线中心35-45 cm处达到最大值，表明这些位置处有局部加热源。已经讨论了负责在特定空间位置进行这种额外加热的不同机制，以探讨其可能的作用。在最高电子温度位置的更下游，可以看到距离天线55-65厘米的密度峰值。下游密度峰值可以通过系统中的压力平衡来解释。

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