SOI nanophotonic waveguide structures fabricated with deep UV lithography

W. Bogaerts; P. Dumon; D. Taillaert; V. Wiaux; S. Beckx; B. Luyssaert; J. Van Campenhout; D. Van Thourhout; R. Baets

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SOI nanophotonic waveguide structures fabricated with deep UV lithography

机译：深紫外光刻技术制备的SOI纳米光子波导结构

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To reduce the dimensions of photonic integrated circuits, high-contrast wavelength-scale structures are needed. We developed a fabrication process for Silicon-on-insulator nanophotonics, based on standard CMOS processing techniques with deep UV lithography. Measurements using either end-fire incoupling or grating-based fibre couplers show photonic crystal waveguides with moderate propagation losses (7.5 dB/mm) and photonic wires with very low propagation losses (0.24 dB/mm).

机译：为了减小光子集成电路的尺寸，需要高对比度的波长尺度结构。我们基于具有深紫外光刻技术的标准CMOS处理技术，开发了绝缘体上硅纳米光子学的制造工艺。使用端射耦合或基于光栅的光纤耦合器进行的测量显示，光子晶体波导具有中等的传播损耗（7.5 dB / mm），光子线具有非常低的传播损耗（0.24 dB / mm）。

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《Photonics and Nanostructures: Fundamentals and Applications》 |2004年第2期|共6页
作者
W. Bogaerts; P. Dumon; D. Taillaert; V. Wiaux; S. Beckx; B. Luyssaert; J. Van Campenhout; D. Van Thourhout; R. Baets;
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正文语种 eng
中图分类光学;
关键词
Nanophotonics; Photonic crystal; Photonic wire;

机译：纳米光子;光子晶体;光子线;

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专利

1. SOI nanophotonic waveguide structures fabricated with deep UV lithography [J] . W. Bogaerts, P. Dumon, D. Taillaert, Photonics and Nanostructures: Fundamentals and Applications . 2004,第2期

机译：深紫外光刻技术制备的SOI纳米光子波导结构
2. Low-Loss SOI Photonic Wires and Ring Resonators Fabricated With Deep UV Lithography [J] . Pieter Dumon, Wim Bogaerts, Vincent Wiaux, IEEE Photonics Technology Letters . 2004,第5期

机译：采用深紫外光刻技术制造的低损耗SOI光子线和环形谐振器
3. DEEP UV LITHOGRAPHY FOR PILLAR TYPE NANOPHOTONIC CRYSTAL [J] . SELIN H. G. TEO, A. Q. LIU, G. L. SIA, International journal of nanoscience . 2005,第4期

机译：柱式纳米光子晶体的深紫外光刻技术
4. Photonic Crystal Waveguides in SOI fabricated with deep UV lithography [C] . W. Bogaerts, V. Wiaux, D. Taillaert, . 2005

机译：采用深紫外光刻技术制造的SOI中的光子晶体波导
5. Nanophotonics for Novel Refractive Index Sensing and Deep UV Light Generation [D] . Gerislioglu, Burak. 2020

机译：新型折射率传感和深紫色光发电的纳米光源
6. In-chip microstructures and photonic devices fabricated by nonlinear laser lithography deep inside silicon [O] . Onur Tokel, Ahmet Turnali, Ghaith Makey, -1

机译：硅内部深处的非线性激光光刻制造的芯片内微结构和光子器件
7. Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography [O] . Zhuang Yanxin, Frandsen Lars Hagedorn, Harpøth Anders, 2004

机译：使用248nm深UV光刻制造的光子晶体波导的波长调谐
8. Modification of Polymer Surfaces and the Fabrication of Submicron-ScaleFunctionalized Structures by Deep-UV and Electron Beam Lithography [R] . Wybourne, M. N., Wu, J. C., Yan, M., 1993

机译：聚合物表面的改性及亚微米级功能化结构的深紫外和电子束光刻制备

SOI nanophotonic waveguide structures fabricated with deep UV lithography

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