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首页> 外文期刊>Progress in photovoltaics >Electron-beam crystallized large grained silicon solar cell on glass substrate
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Electron-beam crystallized large grained silicon solar cell on glass substrate

机译:玻璃基板上的电子束结晶大颗粒硅太阳能电池

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摘要

Thin film hetero-emitter solar cells with large-grained poly-silicon absorbers of around 10 μm thickness have been prepared on glass. The basis of the cell concept is electron-beam-crystallization of an amorphous or nanocrystalline silicon layer deposited onto a SiC:B layer. The SiC:B layer covers a commercially well available glass substrate, serving as diffusion barrier, contact layer and dopand source. For silicon absorber deposition a low pressure chemical vapour deposition was used. The successively applied e-beam crystallization process creates poly-silicon layers with grain sizes up to 1 × 10 mm~2 with low defect densities. The high electronic quality of the absorber is reflected in open circuit voltages as high as 545 mV, which are realized making use of the well-developed a-Si:H hetero-emitter technology.
机译:已经在玻璃上制备了具有约10μm厚度的大晶粒多晶硅吸收体的薄膜异发射极太阳能电池。电池概念的基础是沉积在SiC:B层上的非晶或纳米晶硅层的电子束结晶。 SiC:B层覆盖了市售的玻璃基板,用作扩散阻挡层,接触层和掺杂源。对于硅吸收剂沉积,使用低压化学气相沉积。连续应用的电子束结晶工艺可形成晶粒尺寸高达1×10 mm〜2且具有低缺陷密度的多晶硅层。吸收器的高电子质量反映在高达545 mV的开路电压上,该电压是利用成熟的a-Si:H异质发射极技术实现的。

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