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首页> 外文期刊>Chemistry: A European journal >Conversion of Perhydropolysilazane into a SiO_x Network Triggered by Vacuum Ultraviolet Irradiation: Access to Flexible, Transparent Barrier Coatings
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Conversion of Perhydropolysilazane into a SiO_x Network Triggered by Vacuum Ultraviolet Irradiation: Access to Flexible, Transparent Barrier Coatings

机译：真空紫外线辐照将全氢聚硅氮烷转化为SiO_x网络：获得柔性，透明的阻隔涂层

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摘要

The photochemical conversion of 200-500 nm layers of perhydropolysilazane -(SiH2-NH)_n~- (PHPS) in the presence of oxygen into an SiO_x network was studied. Different UV sources in the wavelength range of 160-240 nm, that is, 172 nm Xe_2~* and 222 nm KrCl~* excimer, and 185 nm Hg low-pressure (HgLP) lamps were used for these purposes. The role of both ozone and O(~1D) as well as of catalytic amounts of tertiary amines in the deg-radation process of PHPS and the formation of SiO_x. were studied. In this context, the kinetics of the entire reaction were elucidated and allowed both a continuous and discontinuous process to be established for the production of fully transparent, flexible barrier coatings. Barrier improvement factors (BIFs) of 400 were achieved with one single layer on 23 mu m poly(ethylene-terephthalate) (PET), which translated into oxygen transmission rates (OTRs) of 0.20 cm~3m~(-2)day~(-1)bar~(-1). Double layers prepared by this technique llowed the realization of OTRs of <= 0.1 cm~3m~(-2)day~(-1)bar~(-1), corresponding to BIFs of >= 800.
机译：研究了在氧气存在下200-500 nm全氢聚硅氮烷-（SiH2-NH）_n〜-（PHPS）的光化学转化为SiO_x网络的过程。为此目的，使用了160-240 nm波长范围内的不同UV源，即172 nm Xe_2〜*和222 nm KrCl〜*准分子，以及185 nm Hg低压（HgLP）灯。臭氧和O（〜1D）以及催化量的叔胺在PHPS脱辐射过程和SiO_x形成中的作用。被研究了。在此情况下，阐明了整个反应的动力学，并允许建立连续和不连续的过程以生产完全透明的柔性阻隔涂层。在23μm聚对苯二甲酸乙二醇酯（PET）上单层获得400的阻障改善因子（BIF），转化为0.20 cm〜3m〜（-2）·day〜（的氧气透过率（OTR））。 -1）bar〜（-1）。通过这种技术制备的双层使得OTR的实现<= 0.1 cm〜3m〜（-2）day〜（-1）bar〜（-1），对应于BIF≥800。

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