首页> 外文期刊>Chemistry: A European journal >Electrochemical Cleavage of N = N Bonds at a Mo_2(mu-SMe)_3 Site Relevant to the Biological Reduction of of Dinitrogen at a Bimetallic Sulfur Centre
【24h】

Electrochemical Cleavage of N = N Bonds at a Mo_2(mu-SMe)_3 Site Relevant to the Biological Reduction of of Dinitrogen at a Bimetallic Sulfur Centre

机译:Mo_2(mu-SMe)_3位点上的N = N键的电化学裂解与双金属硫中心的二氮的生物还原有关

获取原文
获取原文并翻译 | 示例
           

摘要

The reduction of diazene complexes [Mo_2Cp_2(mu-SMe)_3(mu-eta~2-H-N=N-R)]~+ (R = Ph (3a); Me(3b)) and of the hydrazido (2-) derivative [Mo_2Cp_2(mu-SMe)_3{mu-eta~1-N=N(Me)H}]~+ (1b) has been studied by cyclic voltammetry, controlled-potential electrolysis, and coulometry in THF. The electrochemical reduction of 3a in the presence of acid leads to cleavage of the N = N bond and produces aniline and either the amido complex [Mo_2Cp_2(mu-SMe)_(3~-) (mu-NH_2)] 4 or the ammine complex [Mo_2Cp_2(mu-SMe)_3(NH_3)(X)]5, depending on the initial concentration of acid (HX = HTsO or CF_3CO_2H). The N = N bond of the methyldiazene analogue 3nb is not cleaved under the same conditions. The ability of 3a but not 3b to undergo reductive cleavage of the N = N bond is attributed to electronic control of the strength of the Mo-N(R) bond by the R group. The electrochemical reduction of the methylhydrazido (2-) compound 1b in the presence of HX also results in cleavage of the N = N bond, with formation of methylamine, 4 (or 5) and the methyldiazenido complex [Mo_2Cp_2(mu-SMe)_3(mu-eta~1-N = N-Me)]. Formation of the last of these complexes indicates that two mechanisms (N = N bond cleavage and possibly H_2 production) are operative. A patheay for the reduction of N_2 at a dinuclear site of FeMoco is proposed on the basis of these results.
机译:重氮化合物[Mo_2Cp_2(mu-SMe)_3(mu-eta〜2-HN = NR)]〜+(R = Ph(3a); Me(3b))和肼基衍生物(2-)的还原[ Mo_2Cp_2(mu-SMe)_3 {mu-eta〜1-N = N(Me)H}] ++(1b)已通过循环伏安法,控制电位电解和库仑法在THF中进行了研究。在酸的存在下3a的电化学还原导致N = N键的断裂并产生苯胺和酰胺络合物[Mo_2Cp_2(mu-SMe)_(3〜-)(mu-NH_2)] 4或胺络合物[Mo_2Cp_2(mu-SMe)_3(NH_3)(X)] 5,取决于酸的初始浓度(HX = HTsO或CF_3CO_2H)。在相同条件下,甲基二氮杂类似物3nb的N = N键不断裂。 3a但不是3b经历N = N键还原裂解的能力归因于R基团对Mo-N(R)键强度的电子控制。在存在HX的条件下,对甲基肼基(2-)化合物1b进行电化学还原,还会导致N = N键断裂,形成甲胺4(或5)和甲基二氮杂叠氮化合物[Mo_2Cp_2(mu-SMe)_3 (mu-eta〜1-N = N-Me)]。这些复合物的最后形成表明有两种机制(N = N键断裂和可能的H_2产生)起作用。基于这些结果,提出了在FeMoco的双核位点还原N_2的方法。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号