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首页> 外文期刊>Biomolecular engineering >Human serum albumin adsorption onto a-SiC:H and a-C:H thin films deposited by plasma enhanced chemical vapor deposition
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Human serum albumin adsorption onto a-SiC:H and a-C:H thin films deposited by plasma enhanced chemical vapor deposition

机译：血浆增强化学气相沉积法沉积人血清白蛋白到a-SiC：H和a-C：H薄膜上

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摘要

In the present paper, we report the study of the adsorption behavior of a model protein such as human serum albumin (HSA) onto surfaces of a-SiC:H and a-C:H thin films deposited by using the plasma-enhanced chemical vapor deposition (PECVD) technique. The surface composition and surface energy of the various substrates as well as the evaluation of the adsorbed amount of protein has been carried out by means of X-ray photoelectron spectroscopy (XPS) and contact angle measurements. It has been found that HSA tends to preferentially adsorb on Si-rich surfaces, as far as the relative amount of adsorbed HAS decreases with increasing Si-C concentration. Preliminary elements of mechanistic models are proposed for the correlation between chemical factors and the observed protein adsorption behavior.
机译：在本文中，我们报告了对模型蛋白如人血清白蛋白（HSA）在等离子增强化学气相沉积（a-SiC：H和aC：H薄膜）表面上的吸附行为的研究（ PECVD）技术。借助于X射线光电子能谱（XPS）和接触角测量，已经进行了各种基质的表面组成和表面能以及蛋白质吸附量的评估。已经发现，只要吸附的HAS的相对量随Si-C浓度的增加而降低，HSA就倾向于优先吸附在富含Si的表面上。针对化学因子与观察到的蛋白质吸附行为之间的相关性，提出了机理模型的初步要素。

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