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Growth of Quantum-Confined indium Phosphide inside MCM-41

机译:MCM-41内部量子限制的磷化铟的生长

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摘要

An array of analytical techniques comprising powder X-ray diffraction, solid-state NMR spectroscopy, high-resolution transmission electron microscopy, nitrogen adsorption, and UV/vis diffuse reflectance spectroscopy has been applied to study the incorporation of indium phosphide semiconductor inside MCM-41 materials by metal organic chemical vapor deposition. Line broadening in the X-ray diffraction patterns suggests the existence of both large surface deposited indium phosphide particles and nanosized indium phosphide particles deposited within the pores. High-resolution transmission electron microscopy corroborates this result: surface deposits have been imaged, and analysis of electron diffraction patterns provides evidence of the existence of nanoparticles. Nitrogen adsorption provides information on pore filling. Quantum-confinement effects, brought about by the nanoparticle size regime, are evidenced by upfield shifting of the indium phosphide resonance in the 31p magic-angle-spinning NMR spectra and by blue shifting of the band gap dependent transition in the UV/vis absorption spectra.
机译:包括粉末X射线衍射,固态NMR光谱,高分辨率透射电子显微镜,氮吸附和UV / vis漫反射光谱在内的一系列分析技术已用于研究磷化铟半导体在MCM-41内部的掺入材料通过金属有机化学气相沉积。 X射线衍射图中的线展宽表明存在大表面沉积的磷化铟颗粒和沉积在孔内的纳米级磷化铟颗粒。高分辨率透射电子显微镜证实了这一结果:表面沉积物已经成像,并且电子衍射图的分析提供了纳米粒子存在的证据。氮吸附可提供有关孔填充的信息。纳米粒子尺寸机制带来的量子约束效应由31p幻角旋转NMR光谱中磷化铟共振的高场移动和UV / vis吸收光谱中带隙相关跃迁的蓝移证明了。

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