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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Preparation of Epoxy/Silica and Epoxy/Titania Hybrid Resists via a Sol-Gel Process for Nanoimprint Lithography
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Preparation of Epoxy/Silica and Epoxy/Titania Hybrid Resists via a Sol-Gel Process for Nanoimprint Lithography

机译:通过溶胶-凝胶法制备纳米压印光刻胶的环氧/二氧化硅和环氧/二氧化钛杂化抗蚀剂

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In this study, the solvent-free thermocurable epoxy/inorganic hybrid resists were prepared for low-pressure and moderate-temperature imprint lithography. Epoxy/silica and epoxy/titania hybrid resists were synthesized via a sol-gel process from a diglycidyl ether of bisphenol A prepolymer with a metal alkoxide precursor and a coupling agent, 3-glycidyloxypropyltrimethoxysilane. The introduction of the coupling agent results in the reinforced interfacial interaction between the epoxy resin and inorganic nanoparticles. Transmission electron microscopy analyses showed that the silica or titania particles were well-dispersed in the epoxy resin matrix on a nanometer scale without the formation of aggregates. The thermooxidative stability and the glass-transition temperature (T_g) of the epoxy/silica nanocomposite showed improvement compared with the pure epoxy resin. When 10 wt % inorganic nanoparticles were added, the etching resistance of the epoxy/silica and epoxy/ titania nanocomposites increased 4 and 3.2 times, respectively, compared with the pure epoxy resin. The epoxy/inorganic hybrid resist can be imprinted to obtain high-density patterns with a resolution of 110-500 nm on a flexible indium tin oxide/poly(ethylene terephthalate) substrate. The shrinkage of the epoxy/silica and epoxy/titania hybrid resist imprinted patterns decreased to 1.5% and 1.3%, respectively.
机译:在这项研究中,制备了用于低压和中温压印光刻的无溶剂热固化环氧/无机杂化抗蚀剂。环氧/二氧化硅和环氧/二氧化钛杂化抗蚀剂是通过溶胶-凝胶工艺由双酚A预聚物的二缩水甘油醚与金属醇盐前体和偶联剂3-缩水甘油氧基丙基三甲氧基硅烷合成的。偶联剂的引入导致环氧树脂和无机纳米颗粒之间增强的界面相互作用。透射电子显微镜分析表明,二氧化硅或二氧化钛颗粒在纳米尺度上很好地分散在环氧树脂基质中,而没有聚集体的形成。与纯环氧树脂相比,环氧/二氧化硅纳米复合材料的热氧化稳定性和玻璃化转变温度(T_g)有所改善。当添加10重量%的无机纳米颗粒时,与纯环氧树脂相比,环氧/二氧化硅和环氧/二氧化钛纳米复合材料的耐蚀刻性分别提高了4倍和3.2倍。可以在柔性氧化铟锡/聚对苯二甲酸乙二酯衬底上压印环氧/无机杂化抗蚀剂以获得分辨率为110-500 nm的高密度图案。环氧/二氧化硅和环氧/二氧化钛杂化抗蚀剂压印图案的收缩率分别降低至1.5%和1.3%。

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