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Micro-plasma textured Ti-implant surfaces.

机译:微等离子体织构的钛植入物表面。

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The surface state of titanium implants modulates bone response and implant anchorage. This evidence brought implant manufacturers to switch from the standard surface refinements and implement new surface treatments for more bone apposition and enhanced interfacial strength measured by removal torque or push-out tests. Anodic plasma-chemical treatment of implant surfaces is a cost-effective process to modify surface topography and chemistry. This technique is used for structuring connected with a coating of implant surfaces. The aim of our investigations, here, is to texture the implant surface in the nanoscale without coating. Ti disks with different mechanical pre-treatment (grinded, glass blasted) were used as substrate. Micro-plasma texturing was carried out in an aqueous electrolyte. By applying a pulsed DC voltage to the specimen, micro-plasma discharge was generated in the thin steam film between immersed specimen and electrolyte. The electrical process parameter current density was varied. The micro-plasma textured Ti surfaces were characterised optically by SEM and electrochemically by CV- (for testing the corrosion parameters), CA- (to give the enlargement of the real surface) and EIS-measurement in range of 100 kHz-100 microHz. We found that the initial structure of the material surface has small or no influence on the results of the micro-plasma treatment. The properties of the thick oxide layer resulting from the plasma process are influenced by electrical process parameters. After removal of the thick oxide layer a fine, micro- and nanoscaled surface structure of the titanium remains.
机译:钛植入物的表面状态调节骨反应和植入物锚固。这一证据使植入物制造商从标准的表面修饰转向使用新的表面处理,以通过去除扭矩或推出试验测量更多的骨骼并增强界面强度。植入物表面的阳极等离子体化学处理是一种经济有效的方法,可以改变表面的形貌和化学性质。该技术用于与植入物表面涂层连接的结构化。在这里,我们研究的目的是在不进行涂层的情况下使植入物表面纳米化。使用经过不同机械预处理(研磨,喷砂)的Ti圆盘作为基材。微等离子体织构化在水性电解质中进行。通过向样品施加脉冲直流电压,在浸没样品和电解质之间的薄蒸汽膜中产生了微等离子体放电。电气工艺参数电流密度变化。微等离子体织构的Ti表面通过SEM进行光学表征,并通过CV-(用于测试腐蚀参数),CA-(以扩大真实表面)和EIS-测量在100 kHz-100 microHz范围内进行表征。我们发现材料表面的初始结构对微等离子体处理的结果影响很小或没有影响。由等离子体工艺产生的厚氧化物层的特性受电工艺参数的影响。在去除厚的氧化物层之后,保留了精细的,微米级和纳米级的钛表面结构。

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