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首页> 外文期刊>Chemical Physics Letters >Diagnostics of the gas-phase thermal decomposition of Si2H6 using vacuum ultraviolet photoionization
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Diagnostics of the gas-phase thermal decomposition of Si2H6 using vacuum ultraviolet photoionization

机译:真空紫外光电离对Si2H6气相热分解的诊断

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摘要

Vacuum ultraviolet (VUV) photoionization at 10.2 eV was employed for the detection of gas-phase molecules formed after thermal decomposition of disilane at a total pressure of 30 Torr and in the temperature range of 298-740 K. The SinH2(n+1) (n = 3-5) and SinH2n (n = 2-5) species resulting from disilane pyrolysis in a flow reactor were directly observed using time-of-flight mass spectrometry. Unlike multiphoton ionization at 6.4 eV photons, no fragmentation was observed by the VUV single-photon ionization at 10.2 eV. (C) 2000 Elsevier Science B.V. All rights reserved. [References: 20]
机译:在10.2 eV的真空紫外(VUV)光电离被用于检测乙硅烷在30 Torr的总压力和298-740 K的温度范围内热分解后形成的气相分子。SinH2(n + 1)使用飞行时间质谱法直接观察到(n = 3-5)和在流动反应器中乙硅烷热解产生的SinH2n(n = 2-5)物质。与在6.4 eV光子下的多光子电离不同,在10.2 eV的VUV单光子电离没有观察到碎片。 (C)2000 Elsevier Science B.V.保留所有权利。 [参考:20]

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