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首页> 外文期刊>Surface & Coatings Technology >Electrodeposition of aluminium from ionic liquids: Part I - electrodeposition and surface morphology of aluminium from aluminium chloride (AlCl3)-l-ethyl-3-methylimidazolium chloride ([EMIm]Cl) ionic liquids
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Electrodeposition of aluminium from ionic liquids: Part I - electrodeposition and surface morphology of aluminium from aluminium chloride (AlCl3)-l-ethyl-3-methylimidazolium chloride ([EMIm]Cl) ionic liquids

机译：离子液体中铝的电沉积：第一部分-氯化铝（AlCl3）-1-乙基-3-甲基咪唑鎓盐（[EMIm] Cl）离子液体中铝的电沉积和表面形态

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摘要

The electrodeposition and surface morphology of aluminium on tungsten (W) and aluminium (Al) electrodes from 2:1 molar ratio AlCl3-[EMIm]Cl ionic liquids were investigated. Analyses of the chronoamperograms indicate that the deposition process of aluminium on W substrates was controlled by instantaneous nucleation with diffusion-controlled growth, while the deposition processes of aluminium on Al electrodes were found to be associated with kinetic limitations. Constant potential deposition experiments showed that the electrodeposits obtained on both W and Al electrodes between -0.10 and -0.40 V (vs. AI(III)/Al) are dense, continuous and well adherent. Dense aluminium deposits were also obtained on Al substrates using constant current deposition between 10 and 70 mA/cm(2), and the current efficiency was found to be dependent of the current density varying from 85% to 100%. (c) 2005 Elsevier B.V. All rights reserved.
机译：研究了摩尔比为2：1的AlCl3- [EMIm] Cl离子液体对铝在钨（W）和铝（Al）电极上的电沉积和表面形貌。计时电流图的分析表明，铝在W衬底上的沉积过程受具有扩散控制生长的瞬时成核作用的控制，而铝在Al电极上的沉积过程被发现与动力学限制有关。恒电位沉积实验表明，在W和Al电极上-0.10至-0.40 V（vs. AI（III）/ Al）上获得的电沉积物致密，连续且附着良好。还使用10至70 mA / cm（2）之间的恒定电流沉积在Al基板上获得了密集的铝沉积物，并且发现电流效率取决于电流密度（从85％到100％）。 （c）2005 Elsevier B.V.保留所有权利。

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