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首页> 外文期刊>Surface & Coatings Technology >Improve retained dose and impact energy of inner surface plasma immersion ion implantation using long pulse duration with deflecting electric field
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Improve retained dose and impact energy of inner surface plasma immersion ion implantation using long pulse duration with deflecting electric field

机译：使用具有偏转电场的长脉冲持续时间来提高内表面等离子体浸没离子注入的保留剂量和冲击能

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Not restricted by the line-of-sight process, plasma immersion ion implantation (PIII) has shown great potential for inner surface modification, but the impact energy and retained dose turned to be very low. The process was investigated numerically and experimentally in this paper. The results show that a high percentage of low impact energy ions was the key factor that resulted in low impact energy on the inner surface. This was caused by sheath overlapping and appearance of the dead zone during inner surface PIII. Long pulse duration could alleviate this problem and increase ion impact energy on the inner surface, hence the implant depth, which was key factor for the modifying effect of PIII. Also, long pulse duration was helpful in improving the retained dose on the inner surface. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 4]
机译：等离子体浸没离子注入（PIII）不受视线过程的限制，已显示出内表面改性的巨大潜力，但冲击能和保留剂量却非常低。本文对这一过程进行了数值和实验研究。结果表明，高百分比的低冲击能量离子是导致内表面低冲击能量的关键因素。这是由于护套重叠和内表面PIII期间出现死区而引起的。较长的脉冲持续时间可以缓解此问题，并增加内表面上的离子碰撞能量，从而增加注入深度，这是PIII改性效果的关键因素。而且，长脉冲持续时间有助于改善内表面上的保留剂量。 （C）2002 Elsevier Science B.V.保留所有权利。 [参考：4]

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