...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films >Influence of compaction and surface roughness on low-energy ion scattering signals
【24h】

Influence of compaction and surface roughness on low-energy ion scattering signals

机译：压实度和表面粗糙度对低能离子散射信号的影响

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Investigation of the surface composition of powders often requires compaction. To study the effect of compaction on surface analysis, samples have been compacted at various pressures ranging from 0 Pa (i.e. no compaction) up to 2000 MPa (2 X 10(4) kg cm(-2)) Low-energy ion scattering (LEIS) was used to determine the composition of the outermost atomic surface layer. Using scanning electron microscopy, changes in the morphology due to compaction have been detected in the SiO2 test samples. The LEIS yield of a compacted silica powder is found to be independent of the applied pressure during compaction between 2 MPa and 2000 MPa (2 X 10(4) kg cm(-2)). Analysis of a submonolayer of Ta2O5 on a silica support shows that the composition of the outermost atomic layer is not changed after compaction up to a pressure of at least 300 MPa. When compaction is applied, the absolute LEIS yield appears to be independent of the specific surface area of silica supports in the range 50-380 m(2) g(-1). A minor difference in LEIS signals is observed between compacted silica supports and flat quartz samples. In order to determine the surface roughness factor independently, and to study the material dependence of the surface roughness factor, angle-dependent LEIS measurements have been carried out on oxidized silicon, gallium and gold surfaces. The results on the oxidized silicon confirm the small influence of surface roughness for silica particles, whereas measurements on the more closely packed metallic gallium and gold surfaces indicate a significant surface roughness effect. Copyright (C) 2004 John Wiley Sons, Ltd.
机译：研究粉末的表面成分通常需要压实。为了研究压实对表面分析的影响，样品已在0 Pa（即不压实）至2000 MPa（2 X 10（4）kg cm（-2））的各种压力下压实。使用LEIS）确定最外层原子表面层的组成。使用扫描电子显微镜，已经在SiO 2测试样品中检测到由于压实引起的形态变化。发现压实的二氧化硅粉末的LEIS收率与压实期间2 MPa至2000 MPa（2 X 10（4）kg cm（-2））之间的施加压力无关。对二氧化硅载体上的Ta 2 O 5的亚单层的分析表明，最外层的原子层的组成在压实到至少300MPa的压力后没有改变。当施加压实时，绝对LEIS收率似乎与50-380 m（2）g（-1）范围内的二氧化硅载体的比表面积无关。在压实的二氧化硅载体和扁平石英样品之间观察到LEIS信号的微小差异。为了独立确定表面粗糙度因子并研究表面粗糙度因子的材料依赖性，已对氧化的硅，镓和金表面进行了角度依赖性的LEIS测量。氧化硅上的结果证实了表面粗糙度对二氧化硅颗粒的影响很小，而对更紧密堆积的金属镓和金表面的测量表明，表面粗糙度的影响很大。版权所有（C）2004 John Wiley Sons，Ltd.

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号