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首页> 外文期刊>Surface Engineering >Microstructure and nanoindentation hardness of TiN/AIN multilayer films prepared by pulsed laser deposition
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Microstructure and nanoindentation hardness of TiN/AIN multilayer films prepared by pulsed laser deposition

机译：脉冲激光沉积制备的TiN / AIN多层膜的微观结构和纳米压痕硬度

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摘要

TiN/AIN nanoscale multilayer films were deposited on silicon by pulsed laser depositions, with nominal periods of 10, 20, 40 and 100 nm and total thickness of the TiN/AIN multilayer of -500 nm. The microstructure, composition and period of samples were characterised by SEM, nanoindentation and friction tests. The SEM result indicates that the microstructure of the TiN/AIN multilayer film has a good period. The nanoindentation test shows that the hardness of the TiN/AIN multilayer films range from 22 to 30-6 GPa, which is higher than that of a single TiN film (17 GPa). The TiN/AIN multilayer film with a maximum hardness value of 30-6 GPa is associated with more effective combination of solid solution hardening (TiAIN) on the interface. This point is confirmed by X-ray photoelectron spectroscopy. The influences of the period on the microstructure and mechanical properties of films are also investigated. The X-ray diffraction patterns indicate that TiN film exhibits nanocrystalline columns, whereas AIN shows a crystallite structure. The TiN/AIN multilayer film presents typical microstructural features for both materials. In tribological tests, a ball on disc test is used to determine the friction coefficients. The coefficient of steady state friction against a Si_3N_4 ball varies considerably between films grown by different periods. The lowest friction coefficient of ì=0-33 is shown at the TiN/AIN multilayer film, whereas the TiN and AIN single layer film ranges from 0-33 to 0-82.
机译：通过脉冲激光沉积在硅上沉积TiN / AIN纳米级多层膜，标称周期为10、20、40和100 nm，TiN / AIN多层膜的总厚度为-500 nm。通过SEM，纳米压痕和摩擦试验表征了样品的微观结构，组成和时间。 SEM结果表明，TiN / AlN多层膜的微观结构具有良好的周期。纳米压痕测试表明，TiN / AIN多层膜的硬度范围为22至30-6 GPa，高于单个TiN膜（17 GPa）的硬度。最大硬度值为30-6 GPa的TiN / AIN多层膜与界面上固溶硬化（TiAIN）的更有效组合有关。这一点通过X射线光电子能谱法得到证实。还研究了周期对膜的微观结构和机械性能的影响。 X射线衍射图表明TiN膜显示出纳米晶柱，而AlN显示出微晶结构。 TiN / AIN多层膜对两种材料都具有典型的微观结构特征。在摩擦学测试中，使用圆盘球测试来确定摩擦系数。在不同周期生长的薄膜之间，对Si_3N_4球的稳态摩擦系数有很大不同。 TiN / AIN多层膜的最低摩擦系数为“ = 0-33”，而TiN和AIN单层膜的摩擦系数为0-33至0-82。

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