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首页> 外文期刊>Surface Engineering >Effect of AlCl_3, CH_3SO_3H on thickness, current efficiency and corrosion properties of brush plated Cr(III) formate urea baths
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Effect of AlCl_3, CH_3SO_3H on thickness, current efficiency and corrosion properties of brush plated Cr(III) formate urea baths

机译：AlCl_3，CH_3SO_3H对刷镀铬（III）甲酸盐尿素浴的厚度，电流效率和腐蚀性能的影响

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摘要

Brush plating technique was used to deposit trivalent Cr for the first time and effects of AlCl_3 and methane sulphonic acid (CH_3SO_3H) in the trivalent Cr bath was studied. Advantages of brush plated Cr on suitable substrate produced by selective area deposition process with required thickness was investigated. Owing to its portability, flexibility and easy to operate, brush plating has found increasing use in industry. The main applications are for repair and resizing purposes. Brush plated Cr on brass substrate has been investigated using XRD, SEM and AFM. X-ray diffraction analysis revealed that the brush plated Cr(110) was crystalline. Uniform surface coverage of the substrate by granular morphology was observed from SEM and AFM. CH_3SO_3H increases the hydrogen overpotential on Cr deposition, therefore current efficiency and thickness increased. Cr coated from bath containing both AlCl_3 and CH_3SO_3H have better corrosion resistance due to high charge transfer resistance R_(ct) and very low I_(corr) than Cr(III) bath without these additives.
机译：首次采用刷镀技术沉积了三价铬，并研究了三价铬浴中AlCl_3和甲烷磺酸（CH_3SO_3H）的作用。研究了在通过选择性区域沉积工艺生产所需厚度的合适基材上刷镀铬的优势。由于其便携性，灵活性和易于操作，刷镀已在工业中得到越来越多的使用。主要应用是用于维修和调整大小。已经使用XRD，SEM和AFM研究了在黄铜基板上刷镀铬的方法。 X射线衍射分析表明，刷镀Cr（110）是结晶的。通过SEM和AFM观察到通过颗粒形态均匀的基板表面覆盖。 CH_3SO_3H增加了Cr沉积时的氢超电势，因此电流效率和厚度都增加了。与不含这些添加剂的Cr（III）镀液相比，含有AlCl_3和CH_3SO_3H的镀液所镀的Cr具有更好的耐腐蚀性，这是由于其高的电荷转移电阻R_（ct）和非常低的I_（corr）。

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