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Best 2005 tech authors to be recognized at ceremony

机译:2005年最佳科技作者将在颁奖典礼上获得认可

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摘要

The WAI's paper rating committees have chosen the winners of the best technical papers presented in four categories (ferous, nonferrous, electrical and general) in 2005.A total of 18 authors from five countries were awarded for papers they presented at Interwire 2005 and at the International Technical Conference in Prague, Czech Republic. The Allan B. Dove Memorial Medal Award (ferrous) went to Chung-Ming Shih, Taipei Medical University, and Shing-Jong Lin and Chun-Che Shih, Taipei Veterans General Hospital, Taiwan, and Yea-Yang Su, Amorphous Oxide Technologies, Inc., USA, for "Failure analysis of explanted 316L stainless steel sternal wires." The Silver Certificate Award went to Satoshi Kajino and Motoo Asakawa, Waseda University, Japan, for "Effect of additional shear strain layer on tensile strength and ductility of fine drawn wire."
机译:WAI的论文评级委员会在2005年的四类(铁,有色,电气和普通)中评选出了最佳技术论文的获奖者。来自5个国家的18名作者因在Interwire 2005和Interwire 2005上发表的论文而获奖。在捷克共和国布拉格举行的国际技术会议。艾伦·B·多芬纪念奖章(亚军)获得了台北医科大学的施仲明,台湾台北荣民总医院的林圣钟和施振-以及台湾无定形氧化物技术有限公司的苏亚阳, Inc.,美国,用于“ 316L不锈钢胸骨外植体的失效分析”。日本早稻田大学的Katino Satoshi Kajino和Asokawa Motoo获得了银奖,这是因为“额外的剪切应变层对细拉线的拉伸强度和延展性的影响”。

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