Optical properties of silicon carbonitride films produced by plasma-induced decomposition of organic silicon compounds

Fainer N. I.; Nemkova A. A.

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Optical properties of silicon carbonitride films produced by plasma-induced decomposition of organic silicon compounds

机译：等离子体诱导有机硅化合物分解产生的碳氮化硅膜的光学特性

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Optical properties (refractive index; UV, visible, and IR transmission spectra; optical bandgap) of silicon carbonitride SiC (x) N (y) films, promising materials for silicon photonic devices and microelectronics, have been studied. The films have been synthesized by rf plasma-enhanced chemical vapor deposition with thermal activation from parent organosilicon compounds in mixtures with helium, ammonia, nitrogen, or oxygen at a reduced pressure and temperatures of 373-1023 K. The parent substances used are aminosilane- and silazane-series organosilicon precursors.

机译：已经研究了碳氮化硅SiC（x）N（y）薄膜的光学性质（折射率; UV，可见光和IR透射光谱;带隙），这是用于硅光子器件和微电子技术的有希望的材料。薄膜是通过射频等离子体增强化学气相沉积法合成的，并在373-1023 K的减压温度下，与氦，氨，氮或氧的混合物中的母体有机硅化合物进行热活化而得到热活化。所用的母体物质为氨基硅烷和硅氮烷系列有机硅前体。

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《High Energy Chemistry》 |2015年第4期|共9页
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Fainer N. I.; Nemkova A. A.;
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正文语种 eng
中图分类物理化学（理论化学）、化学物理学;
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1. Optical properties of silicon carbonitride films produced by plasma-induced decomposition of organic silicon compounds [J] . Fainer N. I., Nemkova A. A. High Energy Chemistry . 2015,第4期

机译：等离子体诱导有机硅化合物分解产生的碳氮化硅膜的光学特性
2. Carbon-rich amorphous silicon carbide and silicon carbonitride films for silicon-based photoelectric devices and optical elements: Application from UV to mid-IR spectral range [J] . Sha Bo, Lukianov Anatolii N., Dusheiko Mykhailo G., Optical Materials . 2020,第Auga期

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3. Hard silicon carbonitride thin‐film coatings by remote hydrogen plasma chemical vapor deposition using aminosilane and silazane precursors. 2: Physical, optical,and mechanical properties of deposited films [J] . Wrobel Aleksander M., Uznanski Pawel Plasma processes and polymers . 2021,第4期

机译：用氨基硅烷和硅氮烷前体远程氢等离子体化学气相沉积硬硅碳氮化型薄膜涂层。 2：沉积薄膜的物理，光学和机械性能
4. Influence of Different Carbon Precursors on Optical and Electrical Properties of Silicon Carbonitride Thin Films [C] . A. Abdelal, F. Khatami, P. Mascher Electrochemical Society;International Symposium on Nanoscale Luminescent materials . 2020

机译：不同碳前体对碳氮化硅薄膜光学和电性能的影响
5. Characterization of amorphous silicon carbide and silicon carbonitride thin films synthesized by polymer-source chemical vapor deposition. Mechanical structural and metal-interface properties [D] . Awad, Yousef 2006

机译：通过聚合物源化学气相沉积合成的非晶碳化硅和碳氮化硅薄膜的表征。机械结构和金属界面性能
6. Structure and Optical Properties of Co-Sputtered Amorphous Silicon Tin Alloy Films for NIR-II Region Sensor [O] . Xiang-Dong Jiang, Ming-Cheng Li, Rui-Kang Guo, 2019

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7. Dependence of optical properties and hardness on carbon content in silicon carbonitride films deposited by plasma ion immersion processing technique [O] . I.V. Afanasyev-Charkin, M. Nastasi 2003

机译：等离子离子浸渍加工技术沉积的碳碳氮化膜中碳含量的依赖性
8. Preparation and Characterization of Hydrogenated Amorphous-Silicon Films Produced by Ion Plating and Hydrogenated Amorphous-Boron Films Produced by Glow-Discharge Decomposition. Final Report, April 1, 1980-May 31, 1981 [R] . Cocks F.H, Jones, P. L. 1981

机译：添加到阅览室阅读软件下载与<<辉光放电分解制备离子镀和氢化非晶硼薄膜制备氢化非晶硅薄膜及其表征>>相似的文献。最终报告，1980年4月1日至1981年5月31日

Optical properties of silicon carbonitride films produced by plasma-induced decomposition of organic silicon compounds

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