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首页> 外文期刊>High Temperature Material Processes >EFFECT OF THERMAL ANNEALING AND DEPOSITION CONDITIONS ON THE STRUCTURE AND MECHANICAL PROPERTIES OF A MULTILAYER NITRIDE COATING BASED ON Ta
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EFFECT OF THERMAL ANNEALING AND DEPOSITION CONDITIONS ON THE STRUCTURE AND MECHANICAL PROPERTIES OF A MULTILAYER NITRIDE COATING BASED ON Ta

机译：热退火和沉积条件对基于Ta的多层氮化物涂层结构和力学性能的影响

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摘要

An analysis of the structure and mechanical properties of multilayer nitride coatings based on Ta depending on the deposition conditions and thermal vacuum-free annealing was conducted. Ta/TaN is a multylayer structure with alternate deposition of a polycrystalline layer of Ta of high ductility and a layer of TaN of high strength. TaN is a coating deposited by magnetron sputtering with the ratio N_2/Ar = 0.4, exhibiting a high degree of crystallinity that leads to a high adhesive strength and hardness of Ta/TaN multilayer coatings. For nitride coatings based on refractory elements of the V-VI period, the general patterns consisting in the formation of the NaCl structure, and the predominant orientation of the planes (111) were identified. The application of heat treatment decreases the microhardness of the Ta/TaN multilayer coatings from 2600 to 1200 kgf/mm~2, and leads to deterioration of the adhesive strength between the layers. In the process of mechanical testing, the tribological coefficient for the considered protective coatings was 0.1-0.25, the volume of surface wear was 14.3 mm~3.
机译：根据沉积条件和无热真空退火，对基于Ta的多层氮化物涂层的结构和力学性能进行了分析。 Ta / TaN是多层结构，交替沉积高延展性的Ta多晶层和高强度的TaN层。 TaN是通过磁控溅射沉积的比率为N_2 / Ar ＝ 0.4的涂层，表现出高的结晶度，这导致Ta / TaN多层涂层的高粘合强度和硬度。对于基于V-VI期耐火元素的氮化物涂层，确定了由NaCl结构的形成以及平面（111）的主要方向组成的一般图案。热处理的应用将Ta / TaN多层涂层的显微硬度从2600降低到1200 kgf / mm〜2，并导致层之间的粘合强度下降。在机械测试过程中，所考虑的防护涂层的摩擦系数为0.1-0.25，表面磨损量为14.3mm〜3。

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