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首页> 外文期刊>High Temperature Material Processes >OPTICAL DIAGNOSTICS TO CONTROL ON LINE MELTING OF SILICON MATERIAL TREATED BY THERMAL PLASMA PROCESS. NEW IMPROVEMENTS FACED WITH SEVERE CONDITIONS
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OPTICAL DIAGNOSTICS TO CONTROL ON LINE MELTING OF SILICON MATERIAL TREATED BY THERMAL PLASMA PROCESS. NEW IMPROVEMENTS FACED WITH SEVERE CONDITIONS

机译：通过热等离子体处理处理的硅材料在线熔化的光学诊断。面临严峻条件的新改进

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摘要

This experimental study is devoted to the characterization of the RF thermal plasma with an axial injection of silicon particles. We follow experimentally on line silicon powder, to evaluate the main parameters governing the behaviour of this metallurgical grade silicon particles injected axially in the torch. Significant improvements in hardware and soft ware of LDG equipment allowed now real characterizations of the particle trajectory, among other in the zone where hardest physical conditions are facing because of the high temperature of the plasma gas at atmospheric pressure (3000K - 9000K). We performed those measurements by Laser Doppler method in order to qualify the velocity and the grains size during their trajectory in the plasma torch. The goal is to qualify the mass transfer to the thermal trajectory and to fit model simulation and experimental results.
机译：这项实验研究致力于通过轴向注入硅颗粒来表征RF热等离子体。我们对在线硅粉进行实验跟踪，以评估控制该冶金级硅粉轴向喷入焊枪的行为的主要参数。 LDG设备的硬件和软件的重大改进现在可以对颗粒轨迹进行真实的表征，尤其是在等离子气体在大气压下（3000K-9000K）处于高温而面临最困难的物理条件的区域。我们通过激光多普勒方法进行了这些测量，以限定在等离子炬中其运动过程中的速度和晶粒尺寸。目的是使传质符合热轨迹，并使模型仿真和实验结果吻合。

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