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首页> 外文期刊>High Temperature Material Processes >INFLUENCE OF NICKEL OXIDE AMOUNT ON ELECTRICAL PARAMETERS AND STABILITY OF SUPERCAPACITORS
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INFLUENCE OF NICKEL OXIDE AMOUNT ON ELECTRICAL PARAMETERS AND STABILITY OF SUPERCAPACITORS

机译：氧化镍含量对超级电容器电学参数和稳定性的影响

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摘要

A carbonickel oxide composite capacitors were made using arc plasma jet and magnetron sputtering deposition techniques. Carbon coatings were deposited on stainless steel substrates at atmospheric pressure from argon-acetylene gases mixture by plasma jet chemical vapor deposition. Nickel oxide (NiO_(2)) layer was formed on the carbon coating employing magnetron sputtering deposition. The thickness of the deposited nickel oxide film was verified in the range from 18 to 360 nm. In order to characterize differences between produced capacitors, the specific capacitance (C) and maximum working voltage (U) were measured. It was obtained that the increase of NiO_(2) film thickness from 18 nm up to 72 nm, increases capacitance from 9 F g~(-1) up to 15 F g~(-1). Further increase of the metal oxide thickness decreases the specific capacitance value. Experimental results showed that the supercapacitors with thinner nickel oxide layers work much stable. The stability voltages were 0.58 V and 0.35 V, for the capacitors with NiO_(2) layer thickness of 18 nm and 360 nm, respectively.
机译：使用电弧等离子体喷射和磁控溅射沉积技术制造碳/氧化镍复合电容器。在大气压力下，通过等离子流化学气相沉积法从氩-乙炔气体混合物中将碳涂层沉积在不锈钢基材上。使用磁控溅射沉积在碳涂层上形成氧化镍（NiO_（2））层。证实沉积的氧化镍膜的厚度在18至360nm的范围内。为了表征生产的电容器之间的差异，测量了比电容（C）和最大工作电压（U）。结果表明，NiO_（2）膜厚度从18 nm增加到72 nm，电容从9 F g〜（-1）增加到15 F g〜（-1）。金属氧化物厚度的进一步增加降低了比电容值。实验结果表明，具有较薄氧化镍层的超级电容器工作稳定。 NiO_（2）层厚度分别为18 nm和360 nm的电容器的稳定电压分别为0.58 V和0.35V。

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