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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >SF6/Ar plasma textured periodic glass surface morphologies with high transmittance and haze ratio of ITO:Zr films for amorphous silicon thin film solar cells
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SF6/Ar plasma textured periodic glass surface morphologies with high transmittance and haze ratio of ITO:Zr films for amorphous silicon thin film solar cells

机译：用于非晶硅薄膜太阳能电池的ITO：Zr薄膜具有高透射率和雾度比的SF6 / Ar等离子织构化周期性玻璃表面形态

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摘要

We report various SF6/Ar plasma textured periodic glass surface morphologies with high transmittance, haze ratio, and root mean square (rms) roughness of ITO:Zr films for amorphous silicon thin film solar cells (a-Si TFSCs). SF6/Ar plasma textured glass surface morphologies contain micro- and nano-textured features that help to scatter the light in visible and near infra-red (NIR) wavelength regions. We designed the textured glass surface morphologies with big square craters to smaller pyramids for various glass etching times from 30 to 75 min. Magnetron sputtered ITO:Zr (similar to 210 nm) films were deposited on textured glass surface morphologies and showed higher transmittance and haze ratio of 88.48% and 77.61%, respectively, in the visible-NIR (400-1100 nm) wavelength region. The sheet resistance and resistivity of ITO:Zr films decreased with the increase of etching time, due to high rms roughness and better step coverage. A passivation AZO (30 nm) layer was added to the ITO:Zr films, due to its better stability against hydrogen plasma exposure. The ITO:Zr/AZO films were employed as a front TCO layer and the current density voltage (J-V) characteristics of a-Si TFSCs increased by light scattering effect, without any reduction in either the open circuit voltage (V-OC) or the fill factor (FF). Relative to flat glass substrate, J(SC) and the efficiency of a-Si TFSCs were enhanced by 7.51% and 19.39%, respectively, for textured glass surface morphology. (C) 2015 Elsevier Ltd. All rights reserved.
机译：我们报告了用于非晶硅薄膜太阳能电池（a-Si TFSCs）的ITO：Zr膜具有高透射率，雾度比和均方根（rms）粗糙度的SF6 / Ar等离子织构化的周期玻璃表面形态。 SF6 / Ar等离子纹理玻璃表面形态包含微米级和纳米级纹理特征，有助于将可见光和近红外（NIR）波长区域的光散射。我们设计了具有大方形凹坑到较小棱锥的纹理玻璃表面形态，以适应30至75分钟的各种玻璃蚀刻时间。磁控溅射ITO：Zr（类似于210 nm）膜沉积在有纹理的玻璃表面形貌上，并在可见近红外（400-1100 nm）波长区域分别显示出更高的透射率和雾度比，分别为88.48％和77.61％。 ITO：Zr薄膜的薄层电阻和电阻率随着刻蚀时间的增加而降低，这归因于高均方根粗糙度和更好的台阶覆盖率。将钝化AZO（30 nm）层添加到ITO：Zr膜中，因为它对氢等离子体暴露具有更好的稳定性。将ITO：Zr / AZO膜用作正面TCO层，并且通过光散射效应提高a-Si TFSC的电流密度电压（JV）特性，而不会降低开路电压（V-OC）或填充因子（FF）。相对于平板玻璃基板，J（SC）和a-Si TFSC的效率分别提高了有纹理的玻璃表面形态，分别提高了7.51％和19.39％。 （C）2015 Elsevier Ltd.保留所有权利。

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