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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Measurement of outgassing characteristics from a vacuum chamber fabricated for pressure calibration in UHV/XHV region
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Measurement of outgassing characteristics from a vacuum chamber fabricated for pressure calibration in UHV/XHV region

机译：测量用于特高压/特高压地区的压力校准的真空室的脱气特性

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摘要

The construction of a new vacuum system fabricated for pressure calibration in UHV/XHV region is explained together with the measurement of outgassing rate from an XHV chamber used in the system. The outgassing rate was measured using a testchamber by a throughput method after each treatment of the chamber surface such as electrolytic polishing, pre-baking in vacuum, and TiN coating. It was found that the outgassing rate of 3.7×10{sup}-9 Pams {sup}-1 after electrolytical polishing could bereduced to 1.0×10{sup}-13 Pam s{sup} - 1 after pre-baking twice followed by TiN coating. The outgassing rate was also measured by the pressure rise method using the whole XHV chamber, and the result was compared with that obtained with the test chamber.
机译：解释了为在UHV / XHV区域进行压力校准而制造的新型真空系统的构造，以及对系统中使用的XHV腔室的脱气率的测量。在对腔室表面进行每次处理（例如电解抛光，真空预烘烤和TiN涂层）之后，使用测试室通过处理量法测量除气率。发现电解抛光后的3.7×10 {sup} -9 Pams {sup} -1的放气率可以降低到预烘烤两次，然后降低到1.0×10 {sup} -13 Pam s {sup}-1， TiN涂层。还通过使用整个XHV腔室的升压方法测量除气率，并将结果与​​通过测试腔室获得的结果进行比较。

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