A large-volume N-2-Ar microwave plasma source based on surface waves

Ferreira CM; Tatarova E; Henriques J; Dias FM

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A large-volume N-2-Ar microwave plasma source based on surface waves

机译：基于表面波的大体积N-2-Ar微波等离子体源

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摘要

A large-scale, slot-antenna excited surface wave plasma source operating in N-2-Ar mixtures is investigated. The overdense plasma close to the wave energy source, sustained by a pure TM140 surface mode, is analyzed. Maxwell's equations and the rate balance equations for the most important excited species-vibrationally and electronically excited states, ions and nitrogen atoms N(S-4)-are consistently solved and the species spatial distributions are calculated and analyzed in correlation with the total electric field spatial variation. The model predictions for the radiative state populations are validated by means of emission spectroscopy. (C) 2004 Elsevier Ltd. All rights reserved.

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《Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology》 |2004年第3期|共4页
作者
Ferreira CM; Tatarova E; Henriques J; Dias FM;
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正文语种 eng
中图分类真空技术的应用;
关键词
nitrogen; spectroscopy; surface TM mode; dissociation;

机译：氮;光谱;表面TM模式;离解;

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1. A large-volume N-2-Ar microwave plasma source based on surface waves [J] . Ferreira CM, Tatarova E, Henriques J, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2004,第2a3期

机译：基于表面波的大体积N-2-Ar微波等离子体源
2. A large-volume microwave plasma source based on parallel rectangular waveguides at low pressures [J] . Zhang Q., Zhang G., Wang S., Plasma Sources Science & Technology . 2011,第1期

机译：基于平行矩形波导的低压大体积微波等离子体源
3. Microwave-based characterization of an atmospheric pressure microwave-driven plasma source for surface treatment [J] . Rackow K., Ehlbeck J., Krohmann U., Plasma Sources Science & Technology . 2011,第3期

机译：用于表面处理的大气压微波驱动等离子体源的基于微波的表征
4. Comparison of plasma sources for surface treatment applications: Radiofrequency inductively coupled and surface-wave microwave plasma sources [C] . Laurent C., Lo Julia, Caillier Bruno, The 41st IEEE International Conference on Plasma Science, and the 20th International Conference on High-Power Particle Beams . 2014

机译：用于表面处理的等离子源的比较：射频感应耦合和表面波微波等离子源
5. Chemical characterization of PAN based carbon fibers produced by microwave assisted plasma (MAP) technology and effect of plasma treatment on carbon fiber surface and interphase with polymer matrix. [D] . Luo, Xiaoyu. 2006

机译：通过微波辅助等离子体（MAP）技术生产的PAN基碳纤维的化学表征，以及等离子体处理对碳纤维表面和与聚合物基体间相的影响。
6. Fast Determination of Ingredients in Solid Pharmaceuticals by Microwave-Enhanced In-Source Decay of Microwave Plasma Torch Mass Spectrometry [O] . Rui Su, Xinchen Wang, Changming Hou, -1

机译：微波等离子体火炬质谱的微波内源衰减法快速测定固体药物中的成分
7. Plasma surface cleaning in a microwave plasma source [O] . C.C. Tsai, W.D. Nelson, H.H. Haselton, 1994

机译：微波等离子体源中的等离子体表面清洁
8. Minimizing Surface Plasmas in High Power Microwave Sources. [R] . Schamiloglu, E., Gilmore, M., Watts, C. 2011

机译：最大限度地减少高功率微波源中的表面等离子体。

A large-volume N-2-Ar microwave plasma source based on surface waves

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