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首页> 外文期刊>Dalton transactions: An international journal of inorganic chemistry >Aerosol assisted chemical vapour deposition of Cu–ZnO composite from single source precursors
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Aerosol assisted chemical vapour deposition of Cu–ZnO composite from single source precursors

机译：从单一来源的前体气溶胶辅助化学气相沉积铜锌复合材料

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摘要

Two heterobimetallic precursors [Zn(TFA)3(m-OH)Cu3(dmae)3Cl]·THF (1) and [Zn(TFA)4Cu3(dmae)4] (2) [dmae = N,N-dimethylaminoethanolate and TFA = trifluoroacetate], have been synthesized and characterized by their melting points, elemental analysis, FT-IR spectroscopy, mass spectrometry, TGA and single crystal X-ray diffraction methods. Both complexes were used to deposit thin films of Cu–ZnO composite on glass substrates by aerosol assisted chemical vapor deposition (AACVD) method. The films were characterized by “scotch tape” test for adhesion, thickness measurement as a function of temperature, EDX for composition, SEM for surface morphology and XRD for crystalline phases. Thin film deposition studies at 250, 325, 400, 475 C indicated the increase in thickness with temperature reaching a maximum at 400 C and then decreasing. EDX and PXRD results showed the uniform distribution of cubic metallic copper and hexagonal zinc oxide phases which make them useful for nanocatalysis on structured surfaces.
机译：两种异双金属前体[Zn（TFA）3（m-OH）Cu3（dmae）3Cl]·THF（1）和[Zn（TFA）4Cu3（dmae）4]（2）[dmae = N，N-二甲基氨基乙醇酸酯和TFA合成，并通过其熔点，元素分析，FT-IR光谱，质谱，TGA和单晶X射线衍射方法进行了表征。两种配合物均通过气溶胶辅助化学气相沉积（AACVD）方法在玻璃基板上沉积Cu-ZnO复合薄膜。通过“透明胶带”测试粘附性，作为温度的函数的厚度测量，组成的EDX，表面形态的SEM和结晶相的XRD表征薄膜。在250、325、400、475 C下进行的薄膜沉积研究表明，随着温度在400 C达到最大值，厚度增加，然后降低。 EDX和PXRD结果显示立方金属铜和六边形氧化锌相的均匀分布，使其可用于结构化表面的纳米催化。

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