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Correlations between the oscillation modes of arc voltage and pressure in cathode cavity of dc plasma torches

机译：直流等离子炬阴极腔内电弧电压和压力振荡模式之间的相关性

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摘要

The development of coating elaboration processes involving electric arcs depends on process stability and the capacity to ensure a constant reproducibility of coatings properties. This is particularly important when considering the plasma treatment of submicron or nanosized particles in Suspension Plasma Spraying (SPS). Submicron particles closely follow plasma instabilities and have non-homogeneous plasma treatment. Recently, it has been shown that arc voltage fluctuations in dc plasma torches, showing dominant fluctuation frequencies between 4 - 6 kHz, are linked to pressure oscillations in cathode cavity in the rear part of the plasma torch. These resonant oscillations are linked to plasma torch geometry. In this paper, first, we will present a method to isolate the different oscillations modes in measured arc voltage and pressure signals by the use of signal processing methods. Second, correlations between the different modes of oscillations are analyzed following the plasma torch operating parameters.
机译：涉及电弧的涂层细化工艺的发展取决于工艺的稳定性和确保涂层性能恒定再现性的能力。当考虑在悬浮等离子喷涂（SPS）中对亚微米或纳米级颗粒进行等离子体处理时，这一点尤其重要。亚微米颗粒紧密跟随等离子体的不稳定性，并具有不均匀的等离子体处理。近来，已经显示出直流等离子炬中的电弧电压波动，其显示出4-6kHz之间的主要波动频率，与等离子炬后部的阴极腔中的压力振荡有关。这些共振振荡与等离子炬的几何形状有关。在本文中，首先，我们将介绍一种通过使用信号处理方法隔离测得的电弧电压和压力信号中不同振荡模式的方法。其次，根据等离子炬操作参数分析不同振荡模式之间的相关性。

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