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首页> 外文期刊>Journal of Applied Electrochemistry >Electrochemistry of the SUCOPLATE electroplating bath for the deposition of a Cu-Zn-Sn alloy Part I: Commercial bath
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Electrochemistry of the SUCOPLATE electroplating bath for the deposition of a Cu-Zn-Sn alloy Part I: Commercial bath

机译:用于沉积Cu-Zn-Sn合金的SUCOPLATE电镀液的电化学第一部分:商用液

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摘要

The deposition of a Cu-Zn-Sn alloy from a commercial alkaline cyanide electroplating bath operated at 333 K has been investigated using voltammetric techniques and electron microscopy. It is shown that a highly reflecting alloy deposit with a composition in the range 47-51% copper, 8-12% zinc and 38-43% tin can be produced under a range of conditions. In addition, it is concluded that the rate of alloy deposition is partially limited by mass transport and partially by the kinetics of reactions in homogeneous solution.
机译:已经使用伏安技术和电子显微镜研究了从在333 K下运行的商业碱性氰化物电镀浴中沉积Cu-Zn-Sn合金的方法。结果表明,在一定条件下可以生产组成在47-51%的铜,8-12%的锌和38-43%的锡范围内的高反射率合金镀层。此外,可以得出结论,合金的沉积速率部分受传质限制,部分受均相溶液中反应的动力学限制。

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