• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Journal of Applied Polymer Science >Nitroxide-mediated radical polymerization of 4-vinylpyridine and its application on modification of silicon substrate
【24h】

Nitroxide-mediated radical polymerization of 4-vinylpyridine and its application on modification of silicon substrate

机译：一氧化氮介导的4-乙烯基吡啶自由基聚合及其在硅基底改性中的应用

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

The poly(4-vinylpyridine) with hydroxyl end group and narrow polydispersity was synthesized by polymerization of 4-vinylpyridine by the use of nitroxide initiator based on 4-hydroxy-2,2,6,6-tetramethylpiperidin-loxyl and azobisisobutyronitrile. The effects of different initiator amounts and reaction time on polymerization rate, molecular weight, and molecular weight distribution of the poly(4-vinylpyridine) were investigated at bulk polymerization. The experimental results have shown that the polymerization of 4-vinylpyridine is a controlled living free-radical polymerization; the molecular weight is proportional to reaction time; and the molecular weight and molecular weight distribution are affected by molar ratios of [4-hydroxy2,2,6,6-tetramethylpiperidin-l-oxyl]/[azobisisobutyronitrile]. By varying the ratio of 4-hydroxy-2,2,6,6-tetramethylpiperidin-l-oxyl to azobisisobutyronitrile, the poly(4vinylpyridine) with narrow polydispersity can be obtained. X-ray photoelectron spectroscopy results show that the synthesized poly(4-vinylpyridine) can be tethered on the surface of silicon wafer through the reaction between hydroxyl end of poly(4-vinylpyridine) and native silicon oxide layer on the wafer surface. (C) 2002 Wiley Periodicals, Inc. [References: 20]
机译：通过基于4-羟基-2,2,6,6-四甲基哌啶-氧己基和偶氮二异丁腈的硝化引发剂聚合4-乙烯基吡啶，合成了具有羟基端基和窄多分散性的聚（4-乙烯基吡啶）。研究了不同引发剂用量和反应时间对本体聚合反应中聚（4-乙烯基吡啶）聚合速率，分子量和分子量分布的影响。实验结果表明4-乙烯基吡啶的聚合反应是受控的活性自由基聚合反应。分子量与反应时间成正比。 [4-羟基2,2,6,6-四甲基哌啶-1-氧基] / [偶氮二异丁腈]的摩尔比影响分子量和分子量分布。通过改变4-羟基-2,2,6,6-四甲基哌啶-1-氧基与偶氮二异丁腈的比例，可以获得具有窄多分散性的聚（4-乙烯基吡啶）。 X射线光电子能谱分析结果表明，合成的聚（4-乙烯基吡啶）可以通过聚（4-乙烯基吡啶）的羟基末端与晶片表面的天然氧化硅层之间的反应而束缚在硅晶片的表面。 （C）2002 Wiley Periodicals，Inc. [参考：20]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号