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首页> 外文期刊>Journal of Applied Polymer Science >Surface Reaction on Polyvinylidenefluroide (PVDF) Irradiated by Low Energy Ion Bram in Reactive Gas Environment
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Surface Reaction on Polyvinylidenefluroide (PVDF) Irradiated by Low Energy Ion Bram in Reactive Gas Environment

机译：惰性气体环境中低能离子束辐照聚偏氟乙烯（PVDF）的表面反应

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摘要

Polyvinylidenefluoride (PVDF) was irradiated by a keV Ar~+ ion in O_2 environment for improving adhesion between PVDF and Pt, and reaction between PVDF and the ion beam has been investigated by X-ray photoelectron spectroscopy (XPS). The adhesion test between Pt and the modified PVDF was carried out by boiling test, in which the speciments were kept in boiling water for 4 h. Two failure modes (buckling up due to weak adhesion and crack formation due to strong adhesion) of Pt films have been observed in the system. Contact angle of PVDF was reduced to 31 from 75 deg by the irradiation of 1*10~15 Ar~+ ions/cm~2 with oxygen flow rate of 8 sccm. The surface of the irradiated PVDF became more rough as ion dose increased. The improved adhesion mechanism and identification of newly formed chemical species have been confirmed by Carbon 1s and Fluorine 1s X-ray photoelectron core-level spectra. The main reaction occurred at the irradiated PVDF surface is an ion-beam-induced oxidation accompaned with preferential sputtering of fluorine. Newly formed chemical species at interface are regarded as ester and carboxyl groups. Adhesion of the pt-PVDF interface was improved by ion irradiation in O_2 environment. This improvement is originated from the presence of carbon-oxygen bonds on the irradiation PVDF surface. Comparison of failure modes on the irradiated PVDF at various conditions after the boiling test shows that adhesion of Pt films is largely affected by the product of ion-assisted reaction.
机译：在O_2环境中用keV Ar〜+离子辐照聚偏二氟乙烯（PVDF），以改善PVDF与Pt之间的附着力，并通过X射线光电子能谱（XPS）研究了PVDF与离子束之间的反应。通过沸腾试验进行Pt与改性PVDF之间的粘附性试验，其中将样品在沸水中保持4小时。在系统中已观察到两种失效模式（由于粘附力弱而翘曲，以及由于粘附力强而导致裂纹形成）。通过1×10〜15 Ar〜+离子/ cm〜2的辐照和8 sccm的氧气流量将PVDF的接触角从75度减小到31°。随着离子剂量的增加，被照射的PVDF的表面变得更加粗糙。碳1s和氟1s X射线光电子核能级谱已证实了改进的粘附机理和新形成的化学物种的鉴定。发生在被照射的PVDF表面的主要反应是伴随着优先溅射氟的离子束诱导的氧化。在界面上新形成的化学物质被认为是酯基和羧基。在O_2环境中通过离子辐照改善了pt-PVDF界面的附着力。该改进源自照射PVDF表面上碳-氧键的存在。沸腾试验后，在各种条件下对辐照的PVDF的破坏模式的比较表明，Pt膜的附着力在很大程度上受离子辅助反应产物的影响。

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